Formation of organic nanodots with a minimum diameter of 40nm using conventional vacuum vapor deposition

Manabu Nakata, Kenji Kawano, Mao Yasumatsu, Masayuki Yahiro, Chihaya Adachi

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Conventional vacuum deposition onto a substrate coated with a self-assembled monolayer (SAM) was used to produce arrays of hemispherical nanostructures composed of organic semiconducting materials with low molecular weight. The nanostructures had a minimum diameter of 40 nm, indicating that cluster formation occurred in the gas phase during vacuum deposition. The size and shape of the nanostructures were controlled by the underlying SAMs, organic semiconducting materials, film thickness and substrate temperature.

Original languageEnglish
Article number055201
JournalApplied Physics Express
Volume3
Issue number5
DOIs
Publication statusPublished - May 1 2010

Fingerprint

Vacuum deposition
Vapor deposition
vacuum deposition
Nanostructures
vapor deposition
low molecular weights
film thickness
Self assembled monolayers
Substrates
vapor phases
Film thickness
Molecular weight
Gases
temperature
Temperature

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Formation of organic nanodots with a minimum diameter of 40nm using conventional vacuum vapor deposition. / Nakata, Manabu; Kawano, Kenji; Yasumatsu, Mao; Yahiro, Masayuki; Adachi, Chihaya.

In: Applied Physics Express, Vol. 3, No. 5, 055201, 01.05.2010.

Research output: Contribution to journalArticle

Nakata, Manabu ; Kawano, Kenji ; Yasumatsu, Mao ; Yahiro, Masayuki ; Adachi, Chihaya. / Formation of organic nanodots with a minimum diameter of 40nm using conventional vacuum vapor deposition. In: Applied Physics Express. 2010 ; Vol. 3, No. 5.
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