Formation of p-type ultrananocrystalline diamond/nonhydrogenated amorphous carbon composite films prepared by coaxial arc plasma deposition with boron- Incorporated graphite targets

Y. Katamune, S. Ohmagari, H. Setoyama, K. Sumitani, Y. Hirai, T. Yoshitake

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    6 Citations (Scopus)

    Abstract

    Boron-doped ultrananocrystalline diamond (UNCD)/nonhydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were prepared by coaxial arc plasma deposition (CAPD) with boron-blended graphite target. Their growth was achieved at room temperature and a base pressure of less than 10?3 Pa (no inflow gas) owing to CAPD, whereas the growth of UNCD films by chemical vapor deposition generally requires high substrate temperatures of more than 700 °C and a hydrogen ambient gas. The formation of p-type conduction was confirmed thermally, namely Seebeck effect, and heterojunction diodes formed with n-type Si exhibited a typical rectifying action. It was demonstrated that CAPD is advantageous to the practical film formation including doping.

    Original languageEnglish
    Title of host publicationCarbon Nanotubes and Graphene
    Subtitle of host publicationFrom Fundamental Properties and Processes to Applications and Devices
    PublisherElectrochemical Society Inc.
    Pages23-28
    Number of pages6
    Edition20
    ISBN (Print)9781607684015
    DOIs
    Publication statusPublished - 2013
    EventSymposium on Carbon Nanotubes and Graphene: From Fundamental Properties and Processes to Applications and Devices - 222nd ECS Meeting/PRiME 2012 - Honolulu, HI, United States
    Duration: Oct 7 2012Oct 12 2012

    Publication series

    NameECS Transactions
    Number20
    Volume50
    ISSN (Print)1938-5862
    ISSN (Electronic)1938-6737

    Conference

    ConferenceSymposium on Carbon Nanotubes and Graphene: From Fundamental Properties and Processes to Applications and Devices - 222nd ECS Meeting/PRiME 2012
    Country/TerritoryUnited States
    CityHonolulu, HI
    Period10/7/1210/12/12

    All Science Journal Classification (ASJC) codes

    • Engineering(all)

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