Formation of SiC/Si multilayer structures on Si(100) by supersonic free jets of single gas source CH3SiH3

Y. Ikoma, R. Ohtani, T. Motooka

    Research output: Contribution to journalConference articlepeer-review

    5 Citations (Scopus)

    Abstract

    We have investigated formation of SiC/Si multilayers on Si(100) by supersonic free jet CVD utilizing single gas source, CH3SiH 3. The H2 diluted 10% CH3SiH3 gas was introduced into the chamber by using a pulse valve. At first, the substrate temperature was set at 850°C and a SiC layer was grown on Si(100). Then the substrate temperature was reduced to 400-600°C and a Si layer was formed using a tungsten hot filament on the SiC layer. The Si layer was amorphous at the substrate temperature of 400°C while polycrystalline Si was formed at 600°C. SiC/Si/SiC multilayer structures were successfully grown by repeating the CH3SiH3 jet exposures at 850°C and 600°C.

    Original languageEnglish
    Pages (from-to)325-328
    Number of pages4
    JournalMaterials Science Forum
    Volume457-460
    Issue numberI
    Publication statusPublished - Jan 1 2004
    EventProceedings of the 10th International Conference on Silicon Carbide and Related Materials, ICSCRM 2003 - Lyon, France
    Duration: Oct 5 2003Oct 10 2003

    All Science Journal Classification (ASJC) codes

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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