Formation of Si/SiC heterostructures for silicon-based quantum devices using single CH3SiH3-gas source free jet

Ryota Ohtani, Yoshifumi Ikoma, Teruaki Motooka

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Abstract

We have investigated the formation and current-voltage characteristics of Si-dots/SiC multilayer heterostructures on p+Si(100) substrates by means of supersonic free-jet chemical vapor deposition using a single gas source CH3SiH3. Si-dots were successfully deposited on epitaxial SiC thin films on Si(100) with assistance of a tungsten hot filament. Negative deferential resistance was observed in the current-voltage curve of SiC/Si-dot/SiC measured by an atomic force microscope using a gold-coated conductive cantilever. The observed current-voltage characteristics can be attributed to the hole resonant tunneling through the SiC double barriers.

Original languageEnglish
Pages (from-to)83-88
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume815
Publication statusPublished - 2004

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

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