TY - JOUR
T1 - Formation processes of an ordered mixed structure
T2 - Cu(0 0 1)-(2√2 × √2)R45°-Li, Mg
AU - Chen, Ming Shu
AU - Mizuno, Seigi
AU - Tochihara, Hiroshi
N1 - Funding Information:
We appreciate Dr. K. Oka and Prof. T. Oguchi for showing their results before publication. One of the authors (M.-S.C) appreciates a scholarship International Special Course of Interdisciplinary Engineering Sciences supported by the Ministry of Education, Science, Sports and Culture of Japan.
PY - 2002/8/10
Y1 - 2002/8/10
N2 - The formation processes of a (2√2 × √2)R45° structure formed by the coadsorption of Li and Mg on Cu(0 0 1) at room temperature, whose structure has been determined [Surf. Sci. 493 (2001) 91], are examined by low-energy electron diffraction (LEED). By depositing Mg atoms on the Li pre-adsorbed (2 × 1) surface, a sequence of LEED patterns (2 × 1) → c(4 × 4) → (2√2 × √2)R45° was observed. The c(4 × 4) LEED pattern is proved to be due to the coexistence of the (2 × 1)-Li and (2√2 × √2)R45°-Li,Mg structures. On the other hand, when Li was adsorbed on the Mg pre-adsorbed surface, a disordered surface was formed until the (2√2 × √2)R45°-Li,Mg structure appeared at Li coverage of about 0.22. Different formation processes of the (2√2 × √2)R45° structure in the two adsorption sequences are discussed at the atomic level.
AB - The formation processes of a (2√2 × √2)R45° structure formed by the coadsorption of Li and Mg on Cu(0 0 1) at room temperature, whose structure has been determined [Surf. Sci. 493 (2001) 91], are examined by low-energy electron diffraction (LEED). By depositing Mg atoms on the Li pre-adsorbed (2 × 1) surface, a sequence of LEED patterns (2 × 1) → c(4 × 4) → (2√2 × √2)R45° was observed. The c(4 × 4) LEED pattern is proved to be due to the coexistence of the (2 × 1)-Li and (2√2 × √2)R45°-Li,Mg structures. On the other hand, when Li was adsorbed on the Mg pre-adsorbed surface, a disordered surface was formed until the (2√2 × √2)R45°-Li,Mg structure appeared at Li coverage of about 0.22. Different formation processes of the (2√2 × √2)R45° structure in the two adsorption sequences are discussed at the atomic level.
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U2 - 10.1016/S0039-6028(02)01628-X
DO - 10.1016/S0039-6028(02)01628-X
M3 - Article
AN - SCOPUS:0037055529
VL - 514
SP - 194
EP - 199
JO - Surface Science
JF - Surface Science
SN - 0039-6028
IS - 1-3
ER -