Forming of SiO2 film by spin-on glass and CO2 laser annealing for gate insulator of polycrystalline silicon thin film transistors

Daisuke Hishitani, Masahiro Horita, Yasuaki Ishikawa, Hiroshi Ikenoue, Yosuke Watanabe, Yukiharu Uraoka

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science