Gas-phase modeling of chlorine-based chemical vapor deposition of silicon carbide

Stefano Leone, Olof Kordina, Anne Henry, Shinichi Nishizawa, Örjan Danielsson, Erik Janzén

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Kinetic calculations of the chemical phenomena occurring in the epitaxial growth of silicon carbide are performed in this study. The main process parameters analyzed are precursor types, growth temperature, Cl/Si ratio, and precursors' concentration. The analysis of the gas-phase reactions resulted in a model which could explain most of the already reported experimental results, performed in horizontal hot-wall reactors. The effect of using different carbon or silicon precursors is discussed, by comparing the gas-phase composition and the resulting C/Si ratio inside the hot reaction chamber. Chlorinated molecules with three chlorine atoms seem to be the most efficient and resulting in a uniform C/Si ratio along the susceptor coordinate. Further complexity in the process derives from the use of low temperatures, which affects not only the gas-phase composition but also the risk of gas-phase nucleation. The Cl/Si ratio is demonstrated to be crucial not only for the prevention of silicon clusters but also for the uniformity of the gas-phase composition.

Original languageEnglish
Pages (from-to)1977-1984
Number of pages8
JournalCrystal Growth and Design
Volume12
Issue number4
DOIs
Publication statusPublished - Apr 4 2012

Fingerprint

Chlorine
Silicon carbide
silicon carbides
chlorine
Chemical vapor deposition
Gases
vapor deposition
vapor phases
Phase composition
Silicon
Growth temperature
silicon
Epitaxial growth
Nucleation
Carbon
chambers
reactors
silicon carbide
nucleation
Atoms

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Gas-phase modeling of chlorine-based chemical vapor deposition of silicon carbide. / Leone, Stefano; Kordina, Olof; Henry, Anne; Nishizawa, Shinichi; Danielsson, Örjan; Janzén, Erik.

In: Crystal Growth and Design, Vol. 12, No. 4, 04.04.2012, p. 1977-1984.

Research output: Contribution to journalArticle

Leone, S, Kordina, O, Henry, A, Nishizawa, S, Danielsson, Ö & Janzén, E 2012, 'Gas-phase modeling of chlorine-based chemical vapor deposition of silicon carbide', Crystal Growth and Design, vol. 12, no. 4, pp. 1977-1984. https://doi.org/10.1021/cg201684e
Leone, Stefano ; Kordina, Olof ; Henry, Anne ; Nishizawa, Shinichi ; Danielsson, Örjan ; Janzén, Erik. / Gas-phase modeling of chlorine-based chemical vapor deposition of silicon carbide. In: Crystal Growth and Design. 2012 ; Vol. 12, No. 4. pp. 1977-1984.
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