Gas separation silica membranes prepared by chemical vapor deposition of methyl-substituted silanes

Harumi Kato, Sean Thomas B. Lundin, So Jin Ahn, Atsushi Takagaki, Ryuji Kikuchi, S. Ted Oyama

Research output: Contribution to journalArticle

Abstract

The effect on the gas permeance properties and structural morphology of the presence of methyl functional groups in a silica membrane was studied. Membranes were synthesized via chemical vapor deposition (CVD) at 650C and atmospheric pressure using three silicon compounds with differing numbers of methyl-and methoxy-functional groups: tetramethyl orthosilicate (TMOS), methyltrimethoxysilane (MTMOS), and dimethyldimethoxysilane (DMDMOS). The residence time of the silica precursors in the CVD process was adjusted for each precursor and optimized in terms of gas permeance and ideal gas selectivity criteria. Final H2 permeances at 600C for the TMOS-, MTMOS-, and DMDMOS-derived membranes were respectively 1.7 × 10−7, 2.4 × 10−7, and 4.4 × 10−8 mol·m−2·s−1·Pa−1 and H2 /N2 selectivities were 990, 740, and 410. The presence of methyl groups in the membranes fabricated with the MTMOS and DMDMOS precursors was confirmed via Fourier-transform infrared (FTIR) spectroscopy. From FTIR analysis, an increasing methyl signal in the silica structure was correlated with both an improvement in the hydrothermal stability and an increase in the apparent activation energy for hydrogen permeation. In addition, the permeation mechanism for several gas species (He, H2, Ne, CO2, N2, and CH4) was determined by fitting the gas permeance temperature dependence to one of three models: solid state, gas-translational, or surface diffusion.

Original languageEnglish
Article number144
JournalMembranes
Volume9
Issue number11
DOIs
Publication statusPublished - Nov 2019

Fingerprint

Silanes
Silicon Dioxide
Chemical vapor deposition
Gases
Silica
Membranes
Permeation
Functional groups
Silicon Compounds
Silicon compounds
Surface diffusion
Diffusion in gases
Atmospheric pressure
Fourier transform infrared spectroscopy
Hydrogen
Fourier transforms
Activation energy
Infrared radiation

All Science Journal Classification (ASJC) codes

  • Chemical Engineering (miscellaneous)
  • Process Chemistry and Technology
  • Filtration and Separation

Cite this

Gas separation silica membranes prepared by chemical vapor deposition of methyl-substituted silanes. / Kato, Harumi; Lundin, Sean Thomas B.; Ahn, So Jin; Takagaki, Atsushi; Kikuchi, Ryuji; Oyama, S. Ted.

In: Membranes, Vol. 9, No. 11, 144, 11.2019.

Research output: Contribution to journalArticle

Kato, Harumi ; Lundin, Sean Thomas B. ; Ahn, So Jin ; Takagaki, Atsushi ; Kikuchi, Ryuji ; Oyama, S. Ted. / Gas separation silica membranes prepared by chemical vapor deposition of methyl-substituted silanes. In: Membranes. 2019 ; Vol. 9, No. 11.
@article{e6cf98bf3dcd4de7abbf7da2e49dda01,
title = "Gas separation silica membranes prepared by chemical vapor deposition of methyl-substituted silanes",
abstract = "The effect on the gas permeance properties and structural morphology of the presence of methyl functional groups in a silica membrane was studied. Membranes were synthesized via chemical vapor deposition (CVD) at 650◦C and atmospheric pressure using three silicon compounds with differing numbers of methyl-and methoxy-functional groups: tetramethyl orthosilicate (TMOS), methyltrimethoxysilane (MTMOS), and dimethyldimethoxysilane (DMDMOS). The residence time of the silica precursors in the CVD process was adjusted for each precursor and optimized in terms of gas permeance and ideal gas selectivity criteria. Final H2 permeances at 600◦C for the TMOS-, MTMOS-, and DMDMOS-derived membranes were respectively 1.7 × 10−7, 2.4 × 10−7, and 4.4 × 10−8 mol·m−2·s−1·Pa−1 and H2 /N2 selectivities were 990, 740, and 410. The presence of methyl groups in the membranes fabricated with the MTMOS and DMDMOS precursors was confirmed via Fourier-transform infrared (FTIR) spectroscopy. From FTIR analysis, an increasing methyl signal in the silica structure was correlated with both an improvement in the hydrothermal stability and an increase in the apparent activation energy for hydrogen permeation. In addition, the permeation mechanism for several gas species (He, H2, Ne, CO2, N2, and CH4) was determined by fitting the gas permeance temperature dependence to one of three models: solid state, gas-translational, or surface diffusion.",
author = "Harumi Kato and Lundin, {Sean Thomas B.} and Ahn, {So Jin} and Atsushi Takagaki and Ryuji Kikuchi and Oyama, {S. Ted}",
year = "2019",
month = "11",
doi = "10.3390/membranes9110144",
language = "English",
volume = "9",
journal = "Membranes",
issn = "2077-0375",
publisher = "Molecular Diversity Preservation International",
number = "11",

}

TY - JOUR

T1 - Gas separation silica membranes prepared by chemical vapor deposition of methyl-substituted silanes

AU - Kato, Harumi

AU - Lundin, Sean Thomas B.

AU - Ahn, So Jin

AU - Takagaki, Atsushi

AU - Kikuchi, Ryuji

AU - Oyama, S. Ted

PY - 2019/11

Y1 - 2019/11

N2 - The effect on the gas permeance properties and structural morphology of the presence of methyl functional groups in a silica membrane was studied. Membranes were synthesized via chemical vapor deposition (CVD) at 650◦C and atmospheric pressure using three silicon compounds with differing numbers of methyl-and methoxy-functional groups: tetramethyl orthosilicate (TMOS), methyltrimethoxysilane (MTMOS), and dimethyldimethoxysilane (DMDMOS). The residence time of the silica precursors in the CVD process was adjusted for each precursor and optimized in terms of gas permeance and ideal gas selectivity criteria. Final H2 permeances at 600◦C for the TMOS-, MTMOS-, and DMDMOS-derived membranes were respectively 1.7 × 10−7, 2.4 × 10−7, and 4.4 × 10−8 mol·m−2·s−1·Pa−1 and H2 /N2 selectivities were 990, 740, and 410. The presence of methyl groups in the membranes fabricated with the MTMOS and DMDMOS precursors was confirmed via Fourier-transform infrared (FTIR) spectroscopy. From FTIR analysis, an increasing methyl signal in the silica structure was correlated with both an improvement in the hydrothermal stability and an increase in the apparent activation energy for hydrogen permeation. In addition, the permeation mechanism for several gas species (He, H2, Ne, CO2, N2, and CH4) was determined by fitting the gas permeance temperature dependence to one of three models: solid state, gas-translational, or surface diffusion.

AB - The effect on the gas permeance properties and structural morphology of the presence of methyl functional groups in a silica membrane was studied. Membranes were synthesized via chemical vapor deposition (CVD) at 650◦C and atmospheric pressure using three silicon compounds with differing numbers of methyl-and methoxy-functional groups: tetramethyl orthosilicate (TMOS), methyltrimethoxysilane (MTMOS), and dimethyldimethoxysilane (DMDMOS). The residence time of the silica precursors in the CVD process was adjusted for each precursor and optimized in terms of gas permeance and ideal gas selectivity criteria. Final H2 permeances at 600◦C for the TMOS-, MTMOS-, and DMDMOS-derived membranes were respectively 1.7 × 10−7, 2.4 × 10−7, and 4.4 × 10−8 mol·m−2·s−1·Pa−1 and H2 /N2 selectivities were 990, 740, and 410. The presence of methyl groups in the membranes fabricated with the MTMOS and DMDMOS precursors was confirmed via Fourier-transform infrared (FTIR) spectroscopy. From FTIR analysis, an increasing methyl signal in the silica structure was correlated with both an improvement in the hydrothermal stability and an increase in the apparent activation energy for hydrogen permeation. In addition, the permeation mechanism for several gas species (He, H2, Ne, CO2, N2, and CH4) was determined by fitting the gas permeance temperature dependence to one of three models: solid state, gas-translational, or surface diffusion.

UR - http://www.scopus.com/inward/record.url?scp=85074669534&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85074669534&partnerID=8YFLogxK

U2 - 10.3390/membranes9110144

DO - 10.3390/membranes9110144

M3 - Article

AN - SCOPUS:85074669534

VL - 9

JO - Membranes

JF - Membranes

SN - 2077-0375

IS - 11

M1 - 144

ER -