Generation and surface modification of Si nano-particles using SiH 4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics

Kazunori Koga, Giichiro Uchida, Kosuke Yamamoto, Munenori Sato, Yuki Kawashima, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present production of surface nitridated silicon nano-particle composite films for efficient multi exciton generation. Nitridation of silicon nano-particles were produced using double multi-hollow discharge plasma CVD, where generation of silicon nano-particles and their nitridation were independently performed using SiH4/H2 and N2 multi-hollow discharge plasmas. We succeeded in controlling nitrogen contents in silicon nano-particle composite films by varying flux of N radicals irradiated to silicon particles. We also observed strong photoluminescence emission centered at around 700 nm from the films. The PL signal may be attributed to the recombination of exciton confined in silicon nano-p articles.

Original languageEnglish
Title of host publicationInternational Conference on Advances in Condensed and Nano Materials, ICACNM-2011
Pages27-30
Number of pages4
DOIs
Publication statusPublished - 2011
EventInternational Conference on Advances in Condensed and Nano Materials, ICACNM-2011 - Chandigarh, India
Duration: Feb 23 2011Feb 26 2011

Publication series

NameAIP Conference Proceedings
Volume1393
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

OtherInternational Conference on Advances in Condensed and Nano Materials, ICACNM-2011
CountryIndia
CityChandigarh
Period2/23/112/26/11

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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