Global Analysis of Effects of Magnetic Field Configuration on Melt/Crystal Interface Shape and Melt Flow in a Cz-Si Crystal Growth

Koichi Kakimoto, Lijun Liu

Research output: Chapter in Book/Report/Conference proceedingChapter

Original languageEnglish
Title of host publicationCrystal Growth Technology
Subtitle of host publicationFrom Fundamentals and Simulation to Large-scale Production
PublisherWiley - VCH Verlag GmbH & CO. KGaA
Pages195-204
Number of pages10
ISBN (Print)9783527317622
DOIs
Publication statusPublished - Nov 25 2008

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Kakimoto, K., & Liu, L. (2008). Global Analysis of Effects of Magnetic Field Configuration on Melt/Crystal Interface Shape and Melt Flow in a Cz-Si Crystal Growth. In Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production (pp. 195-204). Wiley - VCH Verlag GmbH & CO. KGaA. https://doi.org/10.1002/9783527623440.ch7