Gradient-index microlens formed by ion-beam sputtering

Jun Ichi Shimada, Osamu Ohguchi, Renshi Sawada

Research output: Contribution to journalArticle

20 Citations (Scopus)


This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm x 3 μm at a distemce of 11 μm from the lens facet.

Original languageEnglish
Pages (from-to)5230-5236
Number of pages7
JournalApplied Optics
Issue number25
Publication statusPublished - Sep 1 1992
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Gradient-index microlens formed by ion-beam sputtering'. Together they form a unique fingerprint.

  • Cite this

    Shimada, J. I., Ohguchi, O., & Sawada, R. (1992). Gradient-index microlens formed by ion-beam sputtering. Applied Optics, 31(25), 5230-5236.