Gradient-index microlens formed by ion-beam sputtering

Jun Ichi Shimada; Osamu Ohguchi; Renshi Sawada

doi:10.1364/AO.31.005230

Gradient-index microlens formed by ion-beam sputtering

Jun Ichi Shimada, Osamu Ohguchi, Renshi Sawada

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N₂ gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm x 3 μm at a distemce of 11 μm from the lens facet.

Original language	English
Pages (from-to)	5230-5236
Number of pages	7
Journal	Applied Optics
Volume	31
Issue number	25
DOIs	https://doi.org/10.1364/AO.31.005230
Publication status	Published - Sept 1 1992
Externally published	Yes

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics

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abstract = "This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm x 3 μm at a distemce of 11 μm from the lens facet.",

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year = "1992",

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AU - Sawada, Renshi

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AB - This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm x 3 μm at a distemce of 11 μm from the lens facet.

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Gradient-index microlens formed by ion-beam sputtering

Abstract

All Science Journal Classification (ASJC) codes

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