Growth behavior of boron-doped diamond in microwave plasma-assisted chemical vapor deposition using trimethylboron as the dopant source

Hideaki Maeda, Kyo Ohtsubo, Masanori Kameta, Takeyasu Saito, Katsuki Kusakabe, Shigeharu Morooka, Tanemasa Asano

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21 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds