Growth behavior of boron-doped diamond in microwave plasma-assisted chemical vapor deposition using trimethylboron as the dopant source

Hideaki Maeda, Kyo Ohtsubo, Masanori Kameta, Takeyasu Saito, Katsuki Kusakabe, Shigeharu Morooka, Tanemasa Asano

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Growth behavior of boron-doped diamond in microwave plasma-assisted chemical vapor deposition using trimethylboron as the dopant source'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds