Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si: H Film Deposition

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)
Original languageEnglish
Title of host publicationAdvanced Plasma Technology
PublisherWiley - VCH Verlag GmbH & CO. KGaA
Pages227-242
Number of pages16
ISBN (Print)9783527405916
DOIs
Publication statusPublished - Apr 8 2008

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si : H Film Deposition. / Watanabe, Yukio; Shiratani, Masaharu; Koga, Kazunori.

Advanced Plasma Technology. Wiley - VCH Verlag GmbH & CO. KGaA, 2008. p. 227-242.

Research output: Chapter in Book/Report/Conference proceedingChapter

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booktitle = "Advanced Plasma Technology",
publisher = "Wiley - VCH Verlag GmbH & CO. KGaA",
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T1 - Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si

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AU - Shiratani, Masaharu

AU - Koga, Kazunori

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SN - 9783527405916

SP - 227

EP - 242

BT - Advanced Plasma Technology

PB - Wiley - VCH Verlag GmbH & CO. KGaA

ER -