Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si: H Film Deposition

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)
Original languageEnglish
Title of host publicationAdvanced Plasma Technology
PublisherWiley - VCH Verlag GmbH & CO. KGaA
Pages227-242
Number of pages16
ISBN (Print)9783527405916
DOIs
Publication statusPublished - Apr 8 2008

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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