Growth enhancement of radish sprouts induced by low pressure o 2 radio frequency discharge plasma irradiation

Satoshi Kitazaki; Kazunori Koga; Masaharu Shiratani; Nobuya Hayashi

doi:10.1143/JJAP.51.01AE01

Growth enhancement of radish sprouts induced by low pressure o ₂ radio frequency discharge plasma irradiation

Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi

Research output: Contribution to journal › Article › peer-review

48 Citations (Scopus)

Abstract

We studied growth enhancement of radish sprouts (Raphanus sativus L.) induced by low pressure O ₂ radio frequency (RF) discharge plasma irradiation. The average length of radish sprouts cultivated for 7 days after O ₂ plasma irradiation is 30-60% greater than that without irradiation. O ₂ plasma irradiation does not affect seed germination. The experimental results reveal that oxygen related radicals strongly enhance growth, whereas ions and photons do not.

Original language	English
Article number	01AE01
Journal	Japanese journal of applied physics
Volume	51
Issue number	1 PART 2
DOIs	https://doi.org/10.1143/JJAP.51.01AE01
Publication status	Published - Jan 2012

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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abstract = "We studied growth enhancement of radish sprouts (Raphanus sativus L.) induced by low pressure O 2 radio frequency (RF) discharge plasma irradiation. The average length of radish sprouts cultivated for 7 days after O 2 plasma irradiation is 30-60% greater than that without irradiation. O 2 plasma irradiation does not affect seed germination. The experimental results reveal that oxygen related radicals strongly enhance growth, whereas ions and photons do not.",

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AU - Hayashi, Nobuya

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