Growth of gaseous macromolecules in the downstream region of perfluorocompounds plasmas - Observation, reaction mechanism, thin film formation

Kenji Furuya, Shinobu Yukita, Hiroshi Okumura, Ryoichi Nakanishi, Makoto Makita, Akira Harata

Research output: Contribution to journalArticle

Abstract

The growth of gaseous neutral species and positive ions has been investigated in the downstream region of perfluorocompounds plasmas by mass spectrometry. As a result, there were several series of CnF 2n+1 +, CnF2n-1 + and CnF2n-3 + for the positive ions and C nF2n+2 and CnF2n for the neutral species up to 400 amu in the Ar/CF4 plasmas. The logarithmic plots of the CnF2n+1 + intensity at n≥2 and the CnF2n-1 + intensity at n≥3 with respect to the mass number in the CF4 case were decreased linearly with increase of the mass number. Such property in the plots can be explained by considering the rate equations for the addition reactions of CF2 to CnF2n+1 + at n≥2 and CnF 2n-1 + at n≥3 under the steady-state approximation. Nano-particle formation using the macromolecules growing in the downstream region of the Ar/c-C4F8 plasma was confirmed through X-ray photoelectron spectroscopy and atomic force microscopy.

Original languageEnglish
Pages (from-to)195-197
Number of pages3
JournalShinku/Journal of the Vacuum Society of Japan
Volume49
Issue number3
DOIs
Publication statusPublished - Jun 28 2006

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces

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