Growth stimulation of radish sprouts using discharge plasmas

Satoshi Kitazaki, Daisuke Yamashita, Hidefumi Matsuzaki, Giichirou Uchida, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

11 Citations (Scopus)

Abstract

We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.

Original languageEnglish
Title of host publicationTENCON 2010 - 2010 IEEE Region 10 Conference
Pages1960-1963
Number of pages4
DOIs
Publication statusPublished - 2010
Event2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan
Duration: Nov 21 2010Nov 24 2010

Other

Other2010 IEEE Region 10 Conference, TENCON 2010
CountryJapan
CityFukuoka
Period11/21/1011/24/10

Fingerprint

Plasmas
Irradiation
Atmospheric pressure
Seed
Oxygen

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Computer Science Applications

Cite this

Kitazaki, S., Yamashita, D., Matsuzaki, H., Uchida, G., Koga, K., Shiratani, M., & Hayashi, N. (2010). Growth stimulation of radish sprouts using discharge plasmas. In TENCON 2010 - 2010 IEEE Region 10 Conference (pp. 1960-1963). [5686474] https://doi.org/10.1109/TENCON.2010.5686474

Growth stimulation of radish sprouts using discharge plasmas. / Kitazaki, Satoshi; Yamashita, Daisuke; Matsuzaki, Hidefumi; Uchida, Giichirou; Koga, Kazunori; Shiratani, Masaharu; Hayashi, Nobuya.

TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 1960-1963 5686474.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kitazaki, S, Yamashita, D, Matsuzaki, H, Uchida, G, Koga, K, Shiratani, M & Hayashi, N 2010, Growth stimulation of radish sprouts using discharge plasmas. in TENCON 2010 - 2010 IEEE Region 10 Conference., 5686474, pp. 1960-1963, 2010 IEEE Region 10 Conference, TENCON 2010, Fukuoka, Japan, 11/21/10. https://doi.org/10.1109/TENCON.2010.5686474
Kitazaki S, Yamashita D, Matsuzaki H, Uchida G, Koga K, Shiratani M et al. Growth stimulation of radish sprouts using discharge plasmas. In TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 1960-1963. 5686474 https://doi.org/10.1109/TENCON.2010.5686474
Kitazaki, Satoshi ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Uchida, Giichirou ; Koga, Kazunori ; Shiratani, Masaharu ; Hayashi, Nobuya. / Growth stimulation of radish sprouts using discharge plasmas. TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. pp. 1960-1963
@inproceedings{a68665ee8adb4bab81dd2c7b606d451a,
title = "Growth stimulation of radish sprouts using discharge plasmas",
abstract = "We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 {\%} longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.",
author = "Satoshi Kitazaki and Daisuke Yamashita and Hidefumi Matsuzaki and Giichirou Uchida and Kazunori Koga and Masaharu Shiratani and Nobuya Hayashi",
year = "2010",
doi = "10.1109/TENCON.2010.5686474",
language = "English",
isbn = "9781424468904",
pages = "1960--1963",
booktitle = "TENCON 2010 - 2010 IEEE Region 10 Conference",

}

TY - GEN

T1 - Growth stimulation of radish sprouts using discharge plasmas

AU - Kitazaki, Satoshi

AU - Yamashita, Daisuke

AU - Matsuzaki, Hidefumi

AU - Uchida, Giichirou

AU - Koga, Kazunori

AU - Shiratani, Masaharu

AU - Hayashi, Nobuya

PY - 2010

Y1 - 2010

N2 - We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.

AB - We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60 % longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.

UR - http://www.scopus.com/inward/record.url?scp=79951640885&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79951640885&partnerID=8YFLogxK

U2 - 10.1109/TENCON.2010.5686474

DO - 10.1109/TENCON.2010.5686474

M3 - Conference contribution

SN - 9781424468904

SP - 1960

EP - 1963

BT - TENCON 2010 - 2010 IEEE Region 10 Conference

ER -