Guest Editorial: Emerging Plasma Nanotechnologies

Masaharu Shiratani, John Verboncoeur, Jong Shinn Wu

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English
Pages (from-to)	131-132
Number of pages	2
Journal	IEEE Open Journal of Nanotechnology
Volume	3
DOIs	https://doi.org/10.1109/OJNANO.2022.3224346
Publication status	Published - 2022

All Science Journal Classification (ASJC) codes

@article{7e5bc801572244ee9fa81aac0427f3e2,

title = "Guest Editorial: Emerging Plasma Nanotechnologies",

author = "Masaharu Shiratani and John Verboncoeur and Wu, {Jong Shinn}",

year = "2022",

doi = "10.1109/OJNANO.2022.3224346",

language = "English",

volume = "3",

pages = "131--132",

journal = "IEEE Open Journal of Nanotechnology",

issn = "2644-1292",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

}

TY - JOUR

T1 - Guest Editorial

T2 - Emerging Plasma Nanotechnologies

AU - Shiratani, Masaharu

AU - Verboncoeur, John

AU - Wu, Jong Shinn

PY - 2022

Y1 - 2022

UR - http://www.scopus.com/inward/record.url?scp=85145564684&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85145564684&partnerID=8YFLogxK

U2 - 10.1109/OJNANO.2022.3224346

DO - 10.1109/OJNANO.2022.3224346

M3 - Comment/debate

AN - SCOPUS:85145564684

SN - 2644-1292

VL - 3

SP - 131

EP - 132

JO - IEEE Open Journal of Nanotechnology

JF - IEEE Open Journal of Nanotechnology

ER -