H assisted control of quality and conformality in Cu film deposition using plasma CVD method

Masaharu Shiratani, Hong Jie Jin, Kosuke Takenaka, Kazunori Koga, Toshio Kinoshita, Yukio Watanabe

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Fingerprint

Dive into the research topics of 'H assisted control of quality and conformality in Cu film deposition using plasma CVD method'. Together they form a unique fingerprint.

Chemical Compounds

Earth & Environmental Sciences

Engineering & Materials Science