Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa; Hidekazu Mimura; Satoshi Matsuyama; Hirokatsu Yumoto; Takashi Kimura; Yasuhisa Sano; Kenji Tamasaku; Yoshinori Nishino; Makina Yabashi; Tetsuya Ishikawa; Kazuto Yamauchi

doi:10.1117/12.733749

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

Original language	English
Title of host publication	Advances in Metrology for X-Ray and EUV Optics II
DOIs	https://doi.org/10.1117/12.733749
Publication status	Published - Dec 1 2007
Externally published	Yes
Event	Advances in Metrology for X-Ray and EUV Optics II - San Diego, CA, United States Duration: Aug 30 2007 → Aug 30 2007

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6704
ISSN (Print)	0277-786X

Other

Other	Advances in Metrology for X-Ray and EUV Optics II
Country	United States
City	San Diego, CA
Period	8/30/07 → 8/30/07

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.733749

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Handa, S., Mimura, H., Matsuyama, S., Yumoto, H., Kimura, T., Sano, Y., Tamasaku, K., Nishino, Y., Yabashi, M., Ishikawa, T., & Yamauchi, K. (2007). Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. In Advances in Metrology for X-Ray and EUV Optics II [670404] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6704). https://doi.org/10.1117/12.733749

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. / Handa, Soichiro; Mimura, Hidekazu; Matsuyama, Satoshi; Yumoto, Hirokatsu; Kimura, Takashi; Sano, Yasuhisa; Tamasaku, Kenji; Nishino, Yoshinori; Yabashi, Makina; Ishikawa, Tetsuya; Yamauchi, Kazuto.

Advances in Metrology for X-Ray and EUV Optics II. 2007. 670404 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6704).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Handa, S, Mimura, H, Matsuyama, S, Yumoto, H, Kimura, T, Sano, Y, Tamasaku, K, Nishino, Y, Yabashi, M, Ishikawa, T & Yamauchi, K 2007, Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. in Advances in Metrology for X-Ray and EUV Optics II., 670404, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6704, Advances in Metrology for X-Ray and EUV Optics II, San Diego, CA, United States, 8/30/07. https://doi.org/10.1117/12.733749

Handa, Soichiro ; Mimura, Hidekazu ; Matsuyama, Satoshi ; Yumoto, Hirokatsu ; Kimura, Takashi ; Sano, Yasuhisa ; Tamasaku, Kenji ; Nishino, Yoshinori ; Yabashi, Makina ; Ishikawa, Tetsuya ; Yamauchi, Kazuto. / Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. Advances in Metrology for X-Ray and EUV Optics II. 2007. (Proceedings of SPIE - The International Society for Optical Engineering).

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abstract = "Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.",

author = "Soichiro Handa and Hidekazu Mimura and Satoshi Matsuyama and Hirokatsu Yumoto and Takashi Kimura and Yasuhisa Sano and Kenji Tamasaku and Yoshinori Nishino and Makina Yabashi and Tetsuya Ishikawa and Kazuto Yamauchi",

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AU - Kimura, Takashi

AU - Sano, Yasuhisa

AU - Tamasaku, Kenji

AU - Nishino, Yoshinori

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AU - Ishikawa, Tetsuya

AU - Yamauchi, Kazuto

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