Abstract
Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.
| Original language | English |
|---|---|
| Title of host publication | Advances in Metrology for X-Ray and EUV Optics II |
| DOIs | |
| Publication status | Published - Dec 1 2007 |
| Event | Advances in Metrology for X-Ray and EUV Optics II - San Diego, CA, United States Duration: Aug 30 2007 → Aug 30 2007 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 6704 |
| ISSN (Print) | 0277-786X |
Other
| Other | Advances in Metrology for X-Ray and EUV Optics II |
|---|---|
| Country | United States |
| City | San Diego, CA |
| Period | 8/30/07 → 8/30/07 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
Cite this
Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. / Handa, Soichiro; Mimura, Hidekazu; Matsuyama, Satoshi; Yumoto, Hirokatsu; Kimura, Takashi; Sano, Yasuhisa; Tamasaku, Kenji; Nishino, Yoshinori; Yabashi, Makina; Ishikawa, Tetsuya; Yamauchi, Kazuto.
Advances in Metrology for X-Ray and EUV Optics II. 2007. 670404 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6704).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
AU - Handa, Soichiro
AU - Mimura, Hidekazu
AU - Matsuyama, Satoshi
AU - Yumoto, Hirokatsu
AU - Kimura, Takashi
AU - Sano, Yasuhisa
AU - Tamasaku, Kenji
AU - Nishino, Yoshinori
AU - Yabashi, Makina
AU - Ishikawa, Tetsuya
AU - Yamauchi, Kazuto
PY - 2007/12/1
Y1 - 2007/12/1
N2 - Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.
AB - Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.
UR - http://www.scopus.com/inward/record.url?scp=42149136424&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=42149136424&partnerID=8YFLogxK
U2 - 10.1117/12.733749
DO - 10.1117/12.733749
M3 - Conference contribution
AN - SCOPUS:42149136424
SN - 9780819468529
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Metrology for X-Ray and EUV Optics II
ER -