Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

Original languageEnglish
Title of host publicationAdvances in Metrology for X-Ray and EUV Optics II
DOIs
Publication statusPublished - Dec 1 2007
Externally publishedYes
EventAdvances in Metrology for X-Ray and EUV Optics II - San Diego, CA, United States
Duration: Aug 30 2007Aug 30 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6704
ISSN (Print)0277-786X

Other

OtherAdvances in Metrology for X-Ray and EUV Optics II
CountryUnited States
CitySan Diego, CA
Period8/30/078/30/07

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Handa, S., Mimura, H., Matsuyama, S., Yumoto, H., Kimura, T., Sano, Y., Tamasaku, K., Nishino, Y., Yabashi, M., Ishikawa, T., & Yamauchi, K. (2007). Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. In Advances in Metrology for X-Ray and EUV Optics II [670404] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6704). https://doi.org/10.1117/12.733749