Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

Original languageEnglish
Title of host publicationAdvances in Metrology for X-Ray and EUV Optics II
DOIs
Publication statusPublished - Dec 1 2007
EventAdvances in Metrology for X-Ray and EUV Optics II - San Diego, CA, United States
Duration: Aug 30 2007Aug 30 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6704
ISSN (Print)0277-786X

Other

OtherAdvances in Metrology for X-Ray and EUV Optics II
CountryUnited States
CitySan Diego, CA
Period8/30/078/30/07

Fingerprint

Hard X-ray
Wavefronts
Wave Front
Figure
mirrors
X rays
phase error
profiles
X-ray Mirror
retrieval
Phase Retrieval
Phase Error
Mirrors
x rays
Focal Plane
Mirror
Profile

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Handa, S., Mimura, H., Matsuyama, S., Yumoto, H., Kimura, T., Sano, Y., ... Yamauchi, K. (2007). Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. In Advances in Metrology for X-Ray and EUV Optics II [670404] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6704). https://doi.org/10.1117/12.733749

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. / Handa, Soichiro; Mimura, Hidekazu; Matsuyama, Satoshi; Yumoto, Hirokatsu; Kimura, Takashi; Sano, Yasuhisa; Tamasaku, Kenji; Nishino, Yoshinori; Yabashi, Makina; Ishikawa, Tetsuya; Yamauchi, Kazuto.

Advances in Metrology for X-Ray and EUV Optics II. 2007. 670404 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6704).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Handa, S, Mimura, H, Matsuyama, S, Yumoto, H, Kimura, T, Sano, Y, Tamasaku, K, Nishino, Y, Yabashi, M, Ishikawa, T & Yamauchi, K 2007, Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. in Advances in Metrology for X-Ray and EUV Optics II., 670404, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6704, Advances in Metrology for X-Ray and EUV Optics II, San Diego, CA, United States, 8/30/07. https://doi.org/10.1117/12.733749
Handa S, Mimura H, Matsuyama S, Yumoto H, Kimura T, Sano Y et al. Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. In Advances in Metrology for X-Ray and EUV Optics II. 2007. 670404. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.733749
Handa, Soichiro ; Mimura, Hidekazu ; Matsuyama, Satoshi ; Yumoto, Hirokatsu ; Kimura, Takashi ; Sano, Yasuhisa ; Tamasaku, Kenji ; Nishino, Yoshinori ; Yabashi, Makina ; Ishikawa, Tetsuya ; Yamauchi, Kazuto. / Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. Advances in Metrology for X-Ray and EUV Optics II. 2007. (Proceedings of SPIE - The International Society for Optical Engineering).
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