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High amount cluster incorporation in initial Si film deposition by SiH 4 plasma chemical vapor deposition
Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani
Research output: Contribution to journal › Article › peer-review
10
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(Scopus)