High-density plasma production by hydrogen storage electrode in the tohoku university heliac

H. Utoh, K. Nishimura, Inagaki Shigeru, H. Takahashi, Y. Tanaka, M. Takenaga, M. Ogawa, J. Shinde, K. Iwazaki, A. Okamoto, K. Shinto, S. Kitajima, M. Sasao

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

In the Tohoku University Heliac, a high-density plasma is produced by a vanadium electrode. The vanadium electrode is pretreated for hydrogen storage. In biasing experiments using the vanadium electrode, a high-density plasma is observed in not only argon plasmas but also helium plasmas. When the vanadium electrode is biased negatively, the radial distribution of the electron density steepens at the electrode position, and a strong negative radial electric field is formed between the electrode and the last closed flux surface. The E X B drift velocity is 30 km/s, and the estimated poloidal Mach number Mp is -20. The measured beta value exceeded 0.5% in the low-field discharges.

Original languageEnglish
Pages (from-to)434-439
Number of pages6
JournalFusion Science and Technology
Volume50
Issue number3
DOIs
Publication statusPublished - Jan 1 2006

Fingerprint

Plasma sources
Hydrogen storage
plasma density
Vanadium
vanadium
Electrodes
electrodes
hydrogen
Plasma density
Plasmas
helium plasma
Helium
Argon
argon plasma
radial distribution
Mach number
Carrier concentration
Electric fields
Fluxes
electric fields

All Science Journal Classification (ASJC) codes

  • Civil and Structural Engineering
  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Materials Science(all)
  • Mechanical Engineering

Cite this

High-density plasma production by hydrogen storage electrode in the tohoku university heliac. / Utoh, H.; Nishimura, K.; Shigeru, Inagaki; Takahashi, H.; Tanaka, Y.; Takenaga, M.; Ogawa, M.; Shinde, J.; Iwazaki, K.; Okamoto, A.; Shinto, K.; Kitajima, S.; Sasao, M.

In: Fusion Science and Technology, Vol. 50, No. 3, 01.01.2006, p. 434-439.

Research output: Contribution to journalArticle

Utoh, H, Nishimura, K, Shigeru, I, Takahashi, H, Tanaka, Y, Takenaga, M, Ogawa, M, Shinde, J, Iwazaki, K, Okamoto, A, Shinto, K, Kitajima, S & Sasao, M 2006, 'High-density plasma production by hydrogen storage electrode in the tohoku university heliac', Fusion Science and Technology, vol. 50, no. 3, pp. 434-439. https://doi.org/10.13182/FST06-A1266
Utoh, H. ; Nishimura, K. ; Shigeru, Inagaki ; Takahashi, H. ; Tanaka, Y. ; Takenaga, M. ; Ogawa, M. ; Shinde, J. ; Iwazaki, K. ; Okamoto, A. ; Shinto, K. ; Kitajima, S. ; Sasao, M. / High-density plasma production by hydrogen storage electrode in the tohoku university heliac. In: Fusion Science and Technology. 2006 ; Vol. 50, No. 3. pp. 434-439.
@article{277acf91c79748e381da24c27c3692a4,
title = "High-density plasma production by hydrogen storage electrode in the tohoku university heliac",
abstract = "In the Tohoku University Heliac, a high-density plasma is produced by a vanadium electrode. The vanadium electrode is pretreated for hydrogen storage. In biasing experiments using the vanadium electrode, a high-density plasma is observed in not only argon plasmas but also helium plasmas. When the vanadium electrode is biased negatively, the radial distribution of the electron density steepens at the electrode position, and a strong negative radial electric field is formed between the electrode and the last closed flux surface. The E X B drift velocity is 30 km/s, and the estimated poloidal Mach number Mp is -20. The measured beta value exceeded 0.5{\%} in the low-field discharges.",
author = "H. Utoh and K. Nishimura and Inagaki Shigeru and H. Takahashi and Y. Tanaka and M. Takenaga and M. Ogawa and J. Shinde and K. Iwazaki and A. Okamoto and K. Shinto and S. Kitajima and M. Sasao",
year = "2006",
month = "1",
day = "1",
doi = "10.13182/FST06-A1266",
language = "English",
volume = "50",
pages = "434--439",
journal = "Fusion Science and Technology",
issn = "1536-1055",
publisher = "American Nuclear Society",
number = "3",

}

TY - JOUR

T1 - High-density plasma production by hydrogen storage electrode in the tohoku university heliac

AU - Utoh, H.

AU - Nishimura, K.

AU - Shigeru, Inagaki

AU - Takahashi, H.

AU - Tanaka, Y.

AU - Takenaga, M.

AU - Ogawa, M.

AU - Shinde, J.

AU - Iwazaki, K.

AU - Okamoto, A.

AU - Shinto, K.

AU - Kitajima, S.

AU - Sasao, M.

PY - 2006/1/1

Y1 - 2006/1/1

N2 - In the Tohoku University Heliac, a high-density plasma is produced by a vanadium electrode. The vanadium electrode is pretreated for hydrogen storage. In biasing experiments using the vanadium electrode, a high-density plasma is observed in not only argon plasmas but also helium plasmas. When the vanadium electrode is biased negatively, the radial distribution of the electron density steepens at the electrode position, and a strong negative radial electric field is formed between the electrode and the last closed flux surface. The E X B drift velocity is 30 km/s, and the estimated poloidal Mach number Mp is -20. The measured beta value exceeded 0.5% in the low-field discharges.

AB - In the Tohoku University Heliac, a high-density plasma is produced by a vanadium electrode. The vanadium electrode is pretreated for hydrogen storage. In biasing experiments using the vanadium electrode, a high-density plasma is observed in not only argon plasmas but also helium plasmas. When the vanadium electrode is biased negatively, the radial distribution of the electron density steepens at the electrode position, and a strong negative radial electric field is formed between the electrode and the last closed flux surface. The E X B drift velocity is 30 km/s, and the estimated poloidal Mach number Mp is -20. The measured beta value exceeded 0.5% in the low-field discharges.

UR - http://www.scopus.com/inward/record.url?scp=33750293936&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33750293936&partnerID=8YFLogxK

U2 - 10.13182/FST06-A1266

DO - 10.13182/FST06-A1266

M3 - Article

AN - SCOPUS:33750293936

VL - 50

SP - 434

EP - 439

JO - Fusion Science and Technology

JF - Fusion Science and Technology

SN - 1536-1055

IS - 3

ER -