High performance of compact radical monitoring probe in H2 / N2 mixture plasma

Chang Sung Moon, Keigo Takeda, Seigo Takashima, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The authors have developed a compact monitoring probe for measuring the spatial distribution of the atomic radical densities of hydrogen and nitrogen, employing a vacuum ultraviolet absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. In order to achieve the high performance of measuring the spatial distribution of atomic radical densities, they have tried to realize spatially nonuniform plasma discharge by parallel plates with respective different sizes. It was confirmed that the compact radical monitoring probe enabled one to measure the spatial distribution of atomic radical densities in the plasma precisely. In addition, the etching characteristics of a low- k film were analyzed in H2 / N2 mixture plasma by internal parameters such as radical and ion fluxes coming to the substrate.

Original languageEnglish
Pages (from-to)L17-L20
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume28
Issue number2
DOIs
Publication statusPublished - 2010
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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