High-Power 0.98-µm Strained Quantum-Well Lasers Fabricated Using In Situ Monitored Reactive Ion Beam Etching

Kiichi Hamamoto, Hiroaki Chida, Takashi Miyazaki, Shin Ishikawa

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

0.98-µm wavelength strained quantum-well buried ridge lasers were fabricated using in situ monitored reactive ion beam etching (RIBE). This technique allowed a very accurate ridge geometry, resulting in high single transverse-mode power more than 250 mW and high-fiber coupled power more than 150 mW.

Original languageEnglish
Pages (from-to)602-604
Number of pages3
JournalIEEE Photonics Technology Letters
Volume7
Issue number6
DOIs
Publication statusPublished - Jun 1995
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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