High spatial resolution imaging of helium isotope by TOF-SNMS

Ken ichi Bajo, Satoru Itose, Miyuki Matsuya, Morio Ishihara, Kiichiro Uchino, Masato Kudo, Isao Sakaguchi, Hisayoshi Yurimoto

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Laser ionization mass nanoscope is a time-of-flight sputtered neutral mass spectrometer associated with laser post-ionization by tunneling effect. A spherical and chromatic aberration corrector is installed in the primary ion column. The lateral spatial resolving power of He imaging of solid surface has been evaluated by scanning image using a probe diameter of 90 nm from crater edge slope of a He ion-implanted Si substrate. Helium distribution from the scanning image is quantitatively equivalent with depth profiling analysis from surface of the same substrate, indicating that spatial resolving power of 20 nm for depth resolution has been achieved on the He scanning image through use of oblique incident effect of the primary beam.

Original languageEnglish
Pages (from-to)1190-1193
Number of pages4
JournalSurface and Interface Analysis
Volume48
Issue number11
DOIs
Publication statusPublished - Nov 1 2016

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Helium
helium isotopes
Optical resolving power
Isotopes
spatial resolution
Scanning
Imaging techniques
Ionization
scanning
high resolution
Ions
ionization
Depth profiling
Lasers
Mass spectrometers
Substrates
Aberrations
craters
solid surfaces
mass spectrometers

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Bajo, K. I., Itose, S., Matsuya, M., Ishihara, M., Uchino, K., Kudo, M., ... Yurimoto, H. (2016). High spatial resolution imaging of helium isotope by TOF-SNMS. Surface and Interface Analysis, 48(11), 1190-1193. https://doi.org/10.1002/sia.6085

High spatial resolution imaging of helium isotope by TOF-SNMS. / Bajo, Ken ichi; Itose, Satoru; Matsuya, Miyuki; Ishihara, Morio; Uchino, Kiichiro; Kudo, Masato; Sakaguchi, Isao; Yurimoto, Hisayoshi.

In: Surface and Interface Analysis, Vol. 48, No. 11, 01.11.2016, p. 1190-1193.

Research output: Contribution to journalArticle

Bajo, KI, Itose, S, Matsuya, M, Ishihara, M, Uchino, K, Kudo, M, Sakaguchi, I & Yurimoto, H 2016, 'High spatial resolution imaging of helium isotope by TOF-SNMS', Surface and Interface Analysis, vol. 48, no. 11, pp. 1190-1193. https://doi.org/10.1002/sia.6085
Bajo, Ken ichi ; Itose, Satoru ; Matsuya, Miyuki ; Ishihara, Morio ; Uchino, Kiichiro ; Kudo, Masato ; Sakaguchi, Isao ; Yurimoto, Hisayoshi. / High spatial resolution imaging of helium isotope by TOF-SNMS. In: Surface and Interface Analysis. 2016 ; Vol. 48, No. 11. pp. 1190-1193.
@article{6023c8fc583648989b5026cd577bf7b5,
title = "High spatial resolution imaging of helium isotope by TOF-SNMS",
abstract = "Laser ionization mass nanoscope is a time-of-flight sputtered neutral mass spectrometer associated with laser post-ionization by tunneling effect. A spherical and chromatic aberration corrector is installed in the primary ion column. The lateral spatial resolving power of He imaging of solid surface has been evaluated by scanning image using a probe diameter of 90 nm from crater edge slope of a He ion-implanted Si substrate. Helium distribution from the scanning image is quantitatively equivalent with depth profiling analysis from surface of the same substrate, indicating that spatial resolving power of 20 nm for depth resolution has been achieved on the He scanning image through use of oblique incident effect of the primary beam.",
author = "Bajo, {Ken ichi} and Satoru Itose and Miyuki Matsuya and Morio Ishihara and Kiichiro Uchino and Masato Kudo and Isao Sakaguchi and Hisayoshi Yurimoto",
year = "2016",
month = "11",
day = "1",
doi = "10.1002/sia.6085",
language = "English",
volume = "48",
pages = "1190--1193",
journal = "Surface and Interface Analysis",
issn = "0142-2421",
publisher = "John Wiley and Sons Ltd",
number = "11",

}

TY - JOUR

T1 - High spatial resolution imaging of helium isotope by TOF-SNMS

AU - Bajo, Ken ichi

AU - Itose, Satoru

AU - Matsuya, Miyuki

AU - Ishihara, Morio

AU - Uchino, Kiichiro

AU - Kudo, Masato

AU - Sakaguchi, Isao

AU - Yurimoto, Hisayoshi

PY - 2016/11/1

Y1 - 2016/11/1

N2 - Laser ionization mass nanoscope is a time-of-flight sputtered neutral mass spectrometer associated with laser post-ionization by tunneling effect. A spherical and chromatic aberration corrector is installed in the primary ion column. The lateral spatial resolving power of He imaging of solid surface has been evaluated by scanning image using a probe diameter of 90 nm from crater edge slope of a He ion-implanted Si substrate. Helium distribution from the scanning image is quantitatively equivalent with depth profiling analysis from surface of the same substrate, indicating that spatial resolving power of 20 nm for depth resolution has been achieved on the He scanning image through use of oblique incident effect of the primary beam.

AB - Laser ionization mass nanoscope is a time-of-flight sputtered neutral mass spectrometer associated with laser post-ionization by tunneling effect. A spherical and chromatic aberration corrector is installed in the primary ion column. The lateral spatial resolving power of He imaging of solid surface has been evaluated by scanning image using a probe diameter of 90 nm from crater edge slope of a He ion-implanted Si substrate. Helium distribution from the scanning image is quantitatively equivalent with depth profiling analysis from surface of the same substrate, indicating that spatial resolving power of 20 nm for depth resolution has been achieved on the He scanning image through use of oblique incident effect of the primary beam.

UR - http://www.scopus.com/inward/record.url?scp=84979729393&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84979729393&partnerID=8YFLogxK

U2 - 10.1002/sia.6085

DO - 10.1002/sia.6085

M3 - Article

AN - SCOPUS:84979729393

VL - 48

SP - 1190

EP - 1193

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 11

ER -