Highly accurate differential deposition for X-ray reflective optics

Soichiro Handa; Hidekazu Mimura; Hirokatsu Yumoto; Takashi Kimura; Satoshi Matsuyama; Yasuhisa Sano; Kazuto Yamauchi

doi:10.1002/sia.2812

Highly accurate differential deposition for X-ray reflective optics

Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Research output: Contribution to journal › Article

23 Citations (Scopus)

Abstract

We have developed a highly accurate differential deposition system for the fabrication of X-ray optical devices. Using this system, thin films having a thickness distribution gradually changing along the longitudinal direction on a substrate surface could be produced with sub-nanometer accuracy. The surface flatness of the deposited films was confirmed by atomic force microscopy observation, and the surface was sufficiently smooth to prevent X-ray scattering on the mirror surface. A demonstration of differential deposition was performed and a Pt thin film having the desired thickness profile was successfully deposited on a 100 mm long substrate.

Original language	English
Pages (from-to)	1019-1022
Number of pages	4
Journal	Surface and Interface Analysis
Volume	40
Issue number	6-7
DOIs	https://doi.org/10.1002/sia.2812
Publication status	Published - Jun 1 2008
Externally published	Yes

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All Science Journal Classification (ASJC) codes

Physical and Theoretical Chemistry
Colloid and Surface Chemistry

Cite this

Handa, S., Mimura, H., Yumoto, H., Kimura, T., Matsuyama, S., Sano, Y., & Yamauchi, K. (2008). Highly accurate differential deposition for X-ray reflective optics. Surface and Interface Analysis, 40(6-7), 1019-1022. https://doi.org/10.1002/sia.2812

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AU - Sano, Yasuhisa

AU - Yamauchi, Kazuto

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Access to Document

10.1002/sia.2812