Highly accurate differential deposition for X-ray reflective optics

Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

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23 Citations (Scopus)

Abstract

We have developed a highly accurate differential deposition system for the fabrication of X-ray optical devices. Using this system, thin films having a thickness distribution gradually changing along the longitudinal direction on a substrate surface could be produced with sub-nanometer accuracy. The surface flatness of the deposited films was confirmed by atomic force microscopy observation, and the surface was sufficiently smooth to prevent X-ray scattering on the mirror surface. A demonstration of differential deposition was performed and a Pt thin film having the desired thickness profile was successfully deposited on a 100 mm long substrate.

Original languageEnglish
Pages (from-to)1019-1022
Number of pages4
JournalSurface and Interface Analysis
Volume40
Issue number6-7
DOIs
Publication statusPublished - Jun 1 2008
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

Handa, S., Mimura, H., Yumoto, H., Kimura, T., Matsuyama, S., Sano, Y., & Yamauchi, K. (2008). Highly accurate differential deposition for X-ray reflective optics. Surface and Interface Analysis, 40(6-7), 1019-1022. https://doi.org/10.1002/sia.2812