Highly accurate differential deposition for X-ray reflective optics

Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Kazuto Yamauchi

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

Abstract

We have developed a highly accurate differential deposition system for the fabrication of X-ray optical devices. Using this system, thin films having a thickness distribution gradually changing along the longitudinal direction on a substrate surface could be produced with sub-nanometer accuracy. The surface flatness of the deposited films was confirmed by atomic force microscopy observation, and the surface was sufficiently smooth to prevent X-ray scattering on the mirror surface. A demonstration of differential deposition was performed and a Pt thin film having the desired thickness profile was successfully deposited on a 100 mm long substrate.

Original languageEnglish
Pages (from-to)1019-1022
Number of pages4
JournalSurface and Interface Analysis
Volume40
Issue number6-7
DOIs
Publication statusPublished - Jun 1 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Fingerprint Dive into the research topics of 'Highly accurate differential deposition for X-ray reflective optics'. Together they form a unique fingerprint.

Cite this