Highly oriented and ordered double-helical morphology in ABC triblock terpolymer films up to micrometer thickness by solvent evaporation

Song Hong, Takeshi Higuchi, Hidekazu Sugimori, Takeshi Kaneko, Volker Abetz, Atsushi Takahara, Hiroshi Jinnai

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

A triblock terpolymer, polystyrene-block-polybutadiene-block-poly(methyl methacrylate) (SBM), formed a double-helical nanoscale structure, composed of polybutadiene (PB) helical microdomains around hexagonally packed polystyrene (PS) cores in a poly(methyl methacrylate) matrix. The orientation of double-helical morphologies at various film thicknesses were studied using transmission electron microtomography, following solvent annealing and drying at a controlled solvent evaporation rate. The evaporation rate of the solvent and the film thickness were important factors in whether the double-helical microdomains were oriented parallel or perpendicular with respect to the substrate. In some cases, the perpendicularly aligned double-helical morphology extended several micrometers from the substrate to the air surface. A similar experiment using polystyrene-block-poly(methyl methacrylate) diblock copolymer proved that the presence of helical PB microdomains around PS cylinders is the key factor in achieving a uniform orientation over several micrometers throughout the film thickness.

Original languageEnglish
Pages (from-to)567-572
Number of pages6
JournalPolymer Journal
Volume44
Issue number6
DOIs
Publication statusPublished - Jun 1 2012

Fingerprint

Terpolymers
Polystyrenes
Film thickness
Polybutadienes
Evaporation
Polymethyl methacrylates
Polymethyl Methacrylate
Substrates
Block copolymers
Drying
Annealing
Electrons
Air
polybutadiene
Experiments

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Highly oriented and ordered double-helical morphology in ABC triblock terpolymer films up to micrometer thickness by solvent evaporation. / Hong, Song; Higuchi, Takeshi; Sugimori, Hidekazu; Kaneko, Takeshi; Abetz, Volker; Takahara, Atsushi; Jinnai, Hiroshi.

In: Polymer Journal, Vol. 44, No. 6, 01.06.2012, p. 567-572.

Research output: Contribution to journalArticle

Hong, Song ; Higuchi, Takeshi ; Sugimori, Hidekazu ; Kaneko, Takeshi ; Abetz, Volker ; Takahara, Atsushi ; Jinnai, Hiroshi. / Highly oriented and ordered double-helical morphology in ABC triblock terpolymer films up to micrometer thickness by solvent evaporation. In: Polymer Journal. 2012 ; Vol. 44, No. 6. pp. 567-572.
@article{15f92073e2ab4e21b4628cddfd7cc1ab,
title = "Highly oriented and ordered double-helical morphology in ABC triblock terpolymer films up to micrometer thickness by solvent evaporation",
abstract = "A triblock terpolymer, polystyrene-block-polybutadiene-block-poly(methyl methacrylate) (SBM), formed a double-helical nanoscale structure, composed of polybutadiene (PB) helical microdomains around hexagonally packed polystyrene (PS) cores in a poly(methyl methacrylate) matrix. The orientation of double-helical morphologies at various film thicknesses were studied using transmission electron microtomography, following solvent annealing and drying at a controlled solvent evaporation rate. The evaporation rate of the solvent and the film thickness were important factors in whether the double-helical microdomains were oriented parallel or perpendicular with respect to the substrate. In some cases, the perpendicularly aligned double-helical morphology extended several micrometers from the substrate to the air surface. A similar experiment using polystyrene-block-poly(methyl methacrylate) diblock copolymer proved that the presence of helical PB microdomains around PS cylinders is the key factor in achieving a uniform orientation over several micrometers throughout the film thickness.",
author = "Song Hong and Takeshi Higuchi and Hidekazu Sugimori and Takeshi Kaneko and Volker Abetz and Atsushi Takahara and Hiroshi Jinnai",
year = "2012",
month = "6",
day = "1",
doi = "10.1038/pj.2012.69",
language = "English",
volume = "44",
pages = "567--572",
journal = "Polymer Journal",
issn = "0032-3896",
publisher = "Nature Publishing Group",
number = "6",

}

TY - JOUR

T1 - Highly oriented and ordered double-helical morphology in ABC triblock terpolymer films up to micrometer thickness by solvent evaporation

AU - Hong, Song

AU - Higuchi, Takeshi

AU - Sugimori, Hidekazu

AU - Kaneko, Takeshi

AU - Abetz, Volker

AU - Takahara, Atsushi

AU - Jinnai, Hiroshi

PY - 2012/6/1

Y1 - 2012/6/1

N2 - A triblock terpolymer, polystyrene-block-polybutadiene-block-poly(methyl methacrylate) (SBM), formed a double-helical nanoscale structure, composed of polybutadiene (PB) helical microdomains around hexagonally packed polystyrene (PS) cores in a poly(methyl methacrylate) matrix. The orientation of double-helical morphologies at various film thicknesses were studied using transmission electron microtomography, following solvent annealing and drying at a controlled solvent evaporation rate. The evaporation rate of the solvent and the film thickness were important factors in whether the double-helical microdomains were oriented parallel or perpendicular with respect to the substrate. In some cases, the perpendicularly aligned double-helical morphology extended several micrometers from the substrate to the air surface. A similar experiment using polystyrene-block-poly(methyl methacrylate) diblock copolymer proved that the presence of helical PB microdomains around PS cylinders is the key factor in achieving a uniform orientation over several micrometers throughout the film thickness.

AB - A triblock terpolymer, polystyrene-block-polybutadiene-block-poly(methyl methacrylate) (SBM), formed a double-helical nanoscale structure, composed of polybutadiene (PB) helical microdomains around hexagonally packed polystyrene (PS) cores in a poly(methyl methacrylate) matrix. The orientation of double-helical morphologies at various film thicknesses were studied using transmission electron microtomography, following solvent annealing and drying at a controlled solvent evaporation rate. The evaporation rate of the solvent and the film thickness were important factors in whether the double-helical microdomains were oriented parallel or perpendicular with respect to the substrate. In some cases, the perpendicularly aligned double-helical morphology extended several micrometers from the substrate to the air surface. A similar experiment using polystyrene-block-poly(methyl methacrylate) diblock copolymer proved that the presence of helical PB microdomains around PS cylinders is the key factor in achieving a uniform orientation over several micrometers throughout the film thickness.

UR - http://www.scopus.com/inward/record.url?scp=84861941929&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84861941929&partnerID=8YFLogxK

U2 - 10.1038/pj.2012.69

DO - 10.1038/pj.2012.69

M3 - Article

VL - 44

SP - 567

EP - 572

JO - Polymer Journal

JF - Polymer Journal

SN - 0032-3896

IS - 6

ER -