H2/N2 plasma etching rate of carbon films deposited by H-assisted plasma chemical vapor deposition

Tatsuya Urakawa, Ryuhei Torigoe, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Keigo Takeda, Makoto Sekine, Masaru Hori

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Fingerprint Dive into the research topics of 'H<sub>2</sub>/N<sub>2</sub> plasma etching rate of carbon films deposited by H-assisted plasma chemical vapor deposition'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy