Hybrid mask lithography for fabrication of micro-pattern with nano-pillars

Shinya Sakuma, Masakuni Sugita, Fumihito Arai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

This paper presents the fabrication process of nano-pillar with micro-pattern simultaneously. We proposed the hybrid mask of micro-pattern photo mask and nano-particle mask to obtain the simple fabrication of nano-pillar with micro-pattern. The features of this process are summarized as follows. (1) It is possible to fabricate arbitrary 2D pattern using photolithography. (2) We can get nano-pillar whose size was diffraction-limited by using nano-particle mask. (3) We can control the density of the nano-pillar by changing the weight ratio of nano-particle. (4) We can control the height of the pillar as same the micro-pattern which is the original surface of the substrate.

Original languageEnglish
Title of host publication2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
Pages53-56
Number of pages4
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 - Kyoto, Japan
Duration: Mar 5 2012Mar 8 2012

Publication series

Name2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012

Other

Other7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
Country/TerritoryJapan
CityKyoto
Period3/5/123/8/12

All Science Journal Classification (ASJC) codes

  • Engineering (miscellaneous)

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