Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition

Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Takashi Kojima, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

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