Improvement of breakdown characteristics of the gate oxynitride using N2O

Akihiro Ikeda, Chika Fujiki, Yukinori Kuroki

Research output: Contribution to journalArticlepeer-review

Abstract

Charge trapping and dielectric breakdown (Qbd) properties of rapidly thermal gate oxynitrided (RTON) films have been studied using N2O. The gate voltage shift (ΔVG) has been used to characterize the charge trapping properties under Fowler-Nordheim electron injection from Si substrate. It is found that RTON with N2O can reduce ΔVG resulting from the reduction of trapped electrons. Oxynitridation characteristics in N2O is also discussed. Oxynitridation characteristics can not be explained as classical Deal-Grove model. Deal-Drove model is modified to fit theoretical curve to experimental data.

Original languageEnglish
Pages (from-to)179-184
Number of pages6
JournalResearch Reports on Information Science and Electrical Engineering of Kyushu University
Volume3
Issue number2
Publication statusPublished - 1998
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering
  • Hardware and Architecture

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