Improvement of the surface roughness of LTPS thin films with additional laser irradiation

Fuminobu Hamano; Akira Mizutani; Kaname Imokawa; Daisuke Nakamura; Tetsuya Goto; Hiroshi Ikenoue

Improvement of the surface roughness of LTPS thin films with additional laser irradiation

Fuminobu Hamano, Akira Mizutani, Kaname Imokawa, Daisuke Nakamura, Tetsuya Goto, Hiroshi Ikenoue

Research output: Contribution to journal › Conference article › peer-review

Abstract

A well-known major problem in thin-film transistor (TFT) manufacturing is the protrusions that form on low-temperature polysilicon thin films after excimer laser annealing, which, in turn, induce gate leakage current in the TFTs. In this paper, we report the use of additional laser irradiation to reduce the height of protrusions.

Original language	English
Pages (from-to)	322-324
Number of pages	3
Journal	Proceedings of the International Display Workshops
Volume	27
Publication status	Published - Dec 9 2021
Event	27th International Display Workshops, IDW 2020 - Virtual, Online Duration: Dec 9 2020 → Dec 11 2020

All Science Journal Classification (ASJC) codes

Computer Vision and Pattern Recognition
Human-Computer Interaction
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials

Cite this

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title = "Improvement of the surface roughness of LTPS thin films with additional laser irradiation",

abstract = "A well-known major problem in thin-film transistor (TFT) manufacturing is the protrusions that form on low-temperature polysilicon thin films after excimer laser annealing, which, in turn, induce gate leakage current in the TFTs. In this paper, we report the use of additional laser irradiation to reduce the height of protrusions.",

author = "Fuminobu Hamano and Akira Mizutani and Kaname Imokawa and Daisuke Nakamura and Tetsuya Goto and Hiroshi Ikenoue",

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T1 - Improvement of the surface roughness of LTPS thin films with additional laser irradiation

AU - Hamano, Fuminobu

AU - Mizutani, Akira

AU - Imokawa, Kaname

AU - Nakamura, Daisuke

AU - Goto, Tetsuya

AU - Ikenoue, Hiroshi

PY - 2021/12/9

Y1 - 2021/12/9

N2 - A well-known major problem in thin-film transistor (TFT) manufacturing is the protrusions that form on low-temperature polysilicon thin films after excimer laser annealing, which, in turn, induce gate leakage current in the TFTs. In this paper, we report the use of additional laser irradiation to reduce the height of protrusions.

AB - A well-known major problem in thin-film transistor (TFT) manufacturing is the protrusions that form on low-temperature polysilicon thin films after excimer laser annealing, which, in turn, induce gate leakage current in the TFTs. In this paper, we report the use of additional laser irradiation to reduce the height of protrusions.

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M3 - Conference article

AN - SCOPUS:85111683355

VL - 27

SP - 322

EP - 324

JO - Proceedings of the International Display Workshops

JF - Proceedings of the International Display Workshops

SN - 1883-2490

T2 - 27th International Display Workshops, IDW 2020

Y2 - 9 December 2020 through 11 December 2020

ER -

Improvement of the surface roughness of LTPS thin films with additional laser irradiation

Abstract

All Science Journal Classification (ASJC) codes

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