TY - JOUR
T1 - Impurity-Induced First-Order Phase Transitions in Highly Crystalline V2O3 Nanocrystals
AU - Ishiwata, Yoichi
AU - Takahashi, Eiko
AU - Akashi, Kenta
AU - Imamura, Masaki
AU - Azuma, Junpei
AU - Takahashi, Kazutoshi
AU - Kamada, Masao
AU - Ishii, Hirofumi
AU - Liao, Yen Fa
AU - Tezuka, Yasuhisa
AU - Inagaki, Yuji
AU - Kawae, Tatsuya
AU - Nishio-Hamane, Daisuke
AU - Nantoh, Masashi
AU - Ishibashi, Koji
AU - Kida, Tetsuya
N1 - Publisher Copyright:
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
PY - 2015/8/1
Y1 - 2015/8/1
N2 - A first-order phase transition in a bulk material is generally considered to arise at extended defects such as grain boundaries or dislocations, where the energetic barrier between the two phases is reduced. Downsizing a crystal to the nanoscale can exclude the number of defects, leading to enhanced kinetic stabilization of the metastable phase. Here, the disappearance of the first-order metal-insulator transition in defect-free V2O3 nanocrystals and the revival of the transition by introducing a certain Cr or Ti impurity content are investigated. The hysteresis width of the transition corresponding to the barrier height decreases with the impurity content. It is proposed that homogeneous impurity doping is a universal method that can control the occurrence of a first-order phase transition in nanoscale materials.
AB - A first-order phase transition in a bulk material is generally considered to arise at extended defects such as grain boundaries or dislocations, where the energetic barrier between the two phases is reduced. Downsizing a crystal to the nanoscale can exclude the number of defects, leading to enhanced kinetic stabilization of the metastable phase. Here, the disappearance of the first-order metal-insulator transition in defect-free V2O3 nanocrystals and the revival of the transition by introducing a certain Cr or Ti impurity content are investigated. The hysteresis width of the transition corresponding to the barrier height decreases with the impurity content. It is proposed that homogeneous impurity doping is a universal method that can control the occurrence of a first-order phase transition in nanoscale materials.
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U2 - 10.1002/admi.201500132
DO - 10.1002/admi.201500132
M3 - Article
AN - SCOPUS:84939448279
SN - 2196-7350
VL - 2
JO - Advanced Materials Interfaces
JF - Advanced Materials Interfaces
IS - 12
M1 - 1500132
ER -