In situ measurement of capacitance

A method for fabricating nanoglass

Y. Ohta, M. Kitayama, Kenji Kaneko, S. Toh, F. Shimizu, K. Morinaga

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

The capacitance of the Na 2O-SiO 2 glass was measured in situ during heat treatment at various frequencies, 20, 100, 1, 3, 10, and 30 kHz. It was found that the capacitance of the glass abruptly decreases after a certain duration. The glass was quenched at this stage. It was confirmed by the X-ray diffraction and transmission electron microscopy that this decrease of capacitance was associated with the formation of crystallites in the glass matrix. The size of crystallites was observed to be in the range of about 10 nm.

Original languageEnglish
Pages (from-to)1634-1636
Number of pages3
JournalJournal of the American Ceramic Society
Volume88
Issue number6
DOIs
Publication statusPublished - Jun 1 2005

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Capacitance
Glass
Crystallites
Heat treatment
Transmission electron microscopy
X ray diffraction

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

Cite this

In situ measurement of capacitance : A method for fabricating nanoglass. / Ohta, Y.; Kitayama, M.; Kaneko, Kenji; Toh, S.; Shimizu, F.; Morinaga, K.

In: Journal of the American Ceramic Society, Vol. 88, No. 6, 01.06.2005, p. 1634-1636.

Research output: Contribution to journalArticle

Ohta, Y. ; Kitayama, M. ; Kaneko, Kenji ; Toh, S. ; Shimizu, F. ; Morinaga, K. / In situ measurement of capacitance : A method for fabricating nanoglass. In: Journal of the American Ceramic Society. 2005 ; Vol. 88, No. 6. pp. 1634-1636.
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