In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances

Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM's) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM's. The resulls show that the higher deposition rate leads to the higher volume fraction of clusters.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012
Pages307-311
Number of pages5
DOIs
Publication statusPublished - Nov 28 2012
Event2012 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 9 2012Apr 13 2012

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1426
ISSN (Print)0272-9172

Other

Other2012 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period4/9/124/13/12

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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