In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances

Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM's) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM's. The resulls show that the higher deposition rate leads to the higher volume fraction of clusters.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012
Pages307-311
Number of pages5
DOIs
Publication statusPublished - Nov 28 2012
Event2012 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 9 2012Apr 13 2012

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1426
ISSN (Print)0272-9172

Other

Other2012 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/9/124/13/12

Fingerprint

Quartz crystal microbalances
Silicon
in situ measurement
quartz crystals
microbalances
Volume fraction
Deposition rates
Thin films
silicon
thin films
silicon films
filters

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Kim, Y., Hatozaki, K., Hashimoto, Y., Seo, H., Uchida, G., Kamataki, K., ... Shiratani, M. (2012). In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances. In Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012 (pp. 307-311). (Materials Research Society Symposium Proceedings; Vol. 1426). https://doi.org/10.1557/opl.2012.839

In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances. / Kim, Yeonwon; Hatozaki, Kosuke; Hashimoto, Yuji; Seo, Hyunwoong; Uchida, Giichiro; Kamataki, Kunihiro; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu.

Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. 2012. p. 307-311 (Materials Research Society Symposium Proceedings; Vol. 1426).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, Y, Hatozaki, K, Hashimoto, Y, Seo, H, Uchida, G, Kamataki, K, Itagaki, N, Koga, K & Shiratani, M 2012, In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances. in Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. Materials Research Society Symposium Proceedings, vol. 1426, pp. 307-311, 2012 MRS Spring Meeting, San Francisco, CA, United States, 4/9/12. https://doi.org/10.1557/opl.2012.839
Kim Y, Hatozaki K, Hashimoto Y, Seo H, Uchida G, Kamataki K et al. In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances. In Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. 2012. p. 307-311. (Materials Research Society Symposium Proceedings). https://doi.org/10.1557/opl.2012.839
Kim, Yeonwon ; Hatozaki, Kosuke ; Hashimoto, Yuji ; Seo, Hyunwoong ; Uchida, Giichiro ; Kamataki, Kunihiro ; Itagaki, Naho ; Koga, Kazunori ; Shiratani, Masaharu. / In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances. Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. 2012. pp. 307-311 (Materials Research Society Symposium Proceedings).
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