TY - JOUR
T1 - In situ observation of particle behavior in rf silane plasmas
AU - Shiratani, Masaharu
AU - Matsuo, Syohichiroh
AU - Watanabe, Yukio
PY - 1991/8
Y1 - 1991/8
N2 - In situ observation of growth and behavior of particles formed in rf discharges of silane gas is carried out by using a Mie scattering method together with an rf modulation method, in which the applied voltage is modulated by a low-frequency square wave. The observation reveals that particles have a growth time quite longer than their extinction time and also are charged up negatively to be trapped in the discharging space. The drastic suppression of the particle growth realized in square-wave-amplitude-modulated rf discharges can be explained by taking into account the above features and further fallolf of time-averaged densities of short lifetime species by the rf modulation.
AB - In situ observation of growth and behavior of particles formed in rf discharges of silane gas is carried out by using a Mie scattering method together with an rf modulation method, in which the applied voltage is modulated by a low-frequency square wave. The observation reveals that particles have a growth time quite longer than their extinction time and also are charged up negatively to be trapped in the discharging space. The drastic suppression of the particle growth realized in square-wave-amplitude-modulated rf discharges can be explained by taking into account the above features and further fallolf of time-averaged densities of short lifetime species by the rf modulation.
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U2 - 10.1143/JJAP.30.1887
DO - 10.1143/JJAP.30.1887
M3 - Article
AN - SCOPUS:0026205754
VL - 30
SP - 1887
EP - 1892
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 8
ER -