In situ observation of particle behavior in rf silane plasmas

Masaharu Shiratani, Syohichiroh Matsuo, Yukio Watanabe

Research output: Contribution to journalArticle

30 Citations (Scopus)

Abstract

In situ observation of growth and behavior of particles formed in rf discharges of silane gas is carried out by using a Mie scattering method together with an rf modulation method, in which the applied voltage is modulated by a low-frequency square wave. The observation reveals that particles have a growth time quite longer than their extinction time and also are charged up negatively to be trapped in the discharging space. The drastic suppression of the particle growth realized in square-wave-amplitude-modulated rf discharges can be explained by taking into account the above features and further fallolf of time-averaged densities of short lifetime species by the rf modulation.

Original languageEnglish
Pages (from-to)1887-1892
Number of pages6
JournalJapanese Journal of Applied Physics
Volume30
Issue number8
DOIs
Publication statusPublished - Jan 1 1991

Fingerprint

Silanes
silanes
square waves
Plasmas
Modulation
modulation
Mie scattering
Discharge (fluid mechanics)
extinction
retarding
Scattering
low frequencies
life (durability)
Electric potential
electric potential
Gases
gases

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

In situ observation of particle behavior in rf silane plasmas. / Shiratani, Masaharu; Matsuo, Syohichiroh; Watanabe, Yukio.

In: Japanese Journal of Applied Physics, Vol. 30, No. 8, 01.01.1991, p. 1887-1892.

Research output: Contribution to journalArticle

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