In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching

T. Yatsui, K. Hirata, Y. Tabata, W. Nomura, T. Kawazoe, M. Naruse, M. Ohtsu

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We performed in situ real-time monitoring of the change in surface roughness during self-organized optical near-field etching. During near-field etching of a silica substrate, we detected the scattered light intensity from a continuum wave (CW) laser (λ = 633 nm) in addition to the etching CW laser (λ = 532 nm) light source. We discovered that near-field etching not only decreases surface roughness, but also increases the number of scatterers, as was confirmed by analyzing the AFM image. These approaches provide optimization criteria for the etching parameter and hence for further decreases in surface roughness.

Original languageEnglish
Article number355303
JournalNanotechnology
Volume21
Issue number35
DOIs
Publication statusPublished - Mar 9 2010
Externally publishedYes

Fingerprint

Etching
Surface roughness
Monitoring
Lasers
Silicon Dioxide
Light sources
Silica
Substrates

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)

Cite this

Yatsui, T., Hirata, K., Tabata, Y., Nomura, W., Kawazoe, T., Naruse, M., & Ohtsu, M. (2010). In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching. Nanotechnology, 21(35), [355303]. https://doi.org/10.1088/0957-4484/21/35/355303

In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching. / Yatsui, T.; Hirata, K.; Tabata, Y.; Nomura, W.; Kawazoe, T.; Naruse, M.; Ohtsu, M.

In: Nanotechnology, Vol. 21, No. 35, 355303, 09.03.2010.

Research output: Contribution to journalArticle

Yatsui, T, Hirata, K, Tabata, Y, Nomura, W, Kawazoe, T, Naruse, M & Ohtsu, M 2010, 'In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching', Nanotechnology, vol. 21, no. 35, 355303. https://doi.org/10.1088/0957-4484/21/35/355303
Yatsui, T. ; Hirata, K. ; Tabata, Y. ; Nomura, W. ; Kawazoe, T. ; Naruse, M. ; Ohtsu, M. / In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching. In: Nanotechnology. 2010 ; Vol. 21, No. 35.
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