Incorporation of higher-order silane radicals into A-SI:H films of high stability against light exposure

Masaharu Shiratani, Shinya Iwashita, Kouki Bando, Toshihisa Inoue, Kazunori Koga

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science