Independent control of ion energy and flux in plasma-enhanced diamond growth

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Abstract

Ion energy and flux incident upon a positively biased substrate in an inductively coupled plasma (ICP) have been analyzed during diamond growth at a pressure of 20 mTorr. An electrically floated characteristic of the ICP source allowed a shift up of the plasma potential by the biasing. For the substrate bias (Vb) above 20 V, the ion energy remained constant, while the ion flux was shown to decrease with increasing Vb. The diamond film grown with a high ion flux was composed of well-coalesced large scale islands as compared to that with a low ion flux. The results provide a way to control ion energy and flux independently and its advantage for ion-assisted diamond growth.

Original languageEnglish
Pages (from-to)4067-4069
Number of pages3
JournalApplied Physics Letters
Volume74
Issue number26
DOIs
Publication statusPublished - Jun 28 1999
Externally publishedYes

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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