Abstract
A dipping method has been developed for the infiltration of nanoparticles into an opal template to fabricate high quality inverse opal. Titania and silica inverse opal films, with a uniform color over centimeter dimensions were derived. As there is no need for special substrates or equipment, a widespread application of this method is anticipated.
| Original language | English |
|---|---|
| Pages (from-to) | 127-129 |
| Number of pages | 3 |
| Journal | Applied Physics A: Materials Science and Processing |
| Volume | 74 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Dec 1 2002 |
| Externally published | Yes |
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All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Physics and Astronomy (miscellaneous)
Cite this
Infiltration of colloidal crystal with nanoparticles using capillary forces : A simple technique for the fabrication of films with an ordered porous structure. / Gu, Z. Z.; Kubo, S.; Fujishima, A.; Sato, Osamu.
In: Applied Physics A: Materials Science and Processing, Vol. 74, No. 1, 01.12.2002, p. 127-129.Research output: Contribution to journal › Review article
}
TY - JOUR
T1 - Infiltration of colloidal crystal with nanoparticles using capillary forces
T2 - A simple technique for the fabrication of films with an ordered porous structure
AU - Gu, Z. Z.
AU - Kubo, S.
AU - Fujishima, A.
AU - Sato, Osamu
PY - 2002/12/1
Y1 - 2002/12/1
N2 - A dipping method has been developed for the infiltration of nanoparticles into an opal template to fabricate high quality inverse opal. Titania and silica inverse opal films, with a uniform color over centimeter dimensions were derived. As there is no need for special substrates or equipment, a widespread application of this method is anticipated.
AB - A dipping method has been developed for the infiltration of nanoparticles into an opal template to fabricate high quality inverse opal. Titania and silica inverse opal films, with a uniform color over centimeter dimensions were derived. As there is no need for special substrates or equipment, a widespread application of this method is anticipated.
UR - http://www.scopus.com/inward/record.url?scp=19144367906&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=19144367906&partnerID=8YFLogxK
U2 - 10.1007/s003390101015
DO - 10.1007/s003390101015
M3 - Review article
AN - SCOPUS:19144367906
VL - 74
SP - 127
EP - 129
JO - Applied Physics
JF - Applied Physics
SN - 0340-3793
IS - 1
ER -