Influence of substrate type on surface structure of polymeric perfluorocarbon in the initial stage of deposition in Ar/c-C4F8 plasmas

Kenji Furuya; Ryoichi Nakanishi; Hiroshi Okumura; Makoto Makita; Akira Harata

doi:10.1016/j.tsf.2007.10.112

Influence of substrate type on surface structure of polymeric perfluorocarbon in the initial stage of deposition in Ar/c-C₄F₈ plasmas

Kenji Furuya, Ryoichi Nakanishi, Hiroshi Okumura, Makoto Makita, Akira Harata

Division for Experimental Natural Science

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C₄F₈ plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.

Original language	English
Pages (from-to)	6028-6032
Number of pages	5
Journal	Thin Solid Films
Volume	516
Issue number	18
DOIs	https://doi.org/10.1016/j.tsf.2007.10.112
Publication status	Published - Jul 31 2008

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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abstract = "Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C4F8 plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.",

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AU - Nakanishi, Ryoichi

AU - Okumura, Hiroshi

AU - Makita, Makoto

AU - Harata, Akira

PY - 2008/7/31

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AB - Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C4F8 plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.

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