Influence of substrate type on surface structure of polymeric perfluorocarbon in the initial stage of deposition in Ar/c-C4F8 plasmas

Kenji Furuya, Ryoichi Nakanishi, Hiroshi Okumura, Makoto Makita, Akira Harata

Research output: Contribution to journalArticle

10 Citations (Scopus)


Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C4F8 plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.

Original languageEnglish
Pages (from-to)6028-6032
Number of pages5
JournalThin Solid Films
Issue number18
Publication statusPublished - Jul 31 2008


All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this