Abstract
Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C4F8 plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.
Original language | English |
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Pages (from-to) | 6028-6032 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 516 |
Issue number | 18 |
DOIs | |
Publication status | Published - Jul 31 2008 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry