TY - JOUR
T1 - Influence of the addition of silsesquioxane on the dewetting behavior of polystyrene thin film
AU - Hosaka, Nao
AU - Tanaka, Keiji
AU - Otsuka, Hideyuki
AU - Takahara, Atsushi
N1 - Funding Information:
The present work was supported by a Grant-in-Aid for the 21st Century COE Program, from the Ministry of Education, Culture, Science, Sports and Technology of Japan and P&P Green Chemistry, of Kyushu University, and Grant-in-Aid for Scientific Research (A) (No(2)15205028) and Japan-Korea Basic Scientific Cooperation Program from Japan Society for the Promotion of Science.
PY - 2004
Y1 - 2004
N2 - A strategy to suppress the dewetting of polystyrene (PS) thin films by the addition of octacyclopentylsilsesquioxane (cPOSS) as a nanofiller was proposed. PS thin films with cPOSS were prepared by spin-coating. The bulk glass transition temperature of PS was not changed with an addition of the nanofiller up to 10 wt%. On the other hand, the addition of cPOSS to the PS thin films led to a great inhibition of dewetting. After annealing for 3 h at 373 K, no appreciable dewetting was observed by optical microscopy in the PS film with 15 wt% cPOSS, in contrast, the PS film without cPOSS was completely dewetted. Holes formed on the PS films with 10 wt% cPOSS. However, in that case, the growth of the holes stopped before reaching the final stage of the dewetting. This suggests that the increase of the cPOSS concentration per unit area at the rim of the holes prevents further growth of the holes, and this inhibition effect can be attributed to the interaction between cPOSS and the substrate accompanying modification of the PS-substrate interface.
AB - A strategy to suppress the dewetting of polystyrene (PS) thin films by the addition of octacyclopentylsilsesquioxane (cPOSS) as a nanofiller was proposed. PS thin films with cPOSS were prepared by spin-coating. The bulk glass transition temperature of PS was not changed with an addition of the nanofiller up to 10 wt%. On the other hand, the addition of cPOSS to the PS thin films led to a great inhibition of dewetting. After annealing for 3 h at 373 K, no appreciable dewetting was observed by optical microscopy in the PS film with 15 wt% cPOSS, in contrast, the PS film without cPOSS was completely dewetted. Holes formed on the PS films with 10 wt% cPOSS. However, in that case, the growth of the holes stopped before reaching the final stage of the dewetting. This suggests that the increase of the cPOSS concentration per unit area at the rim of the holes prevents further growth of the holes, and this inhibition effect can be attributed to the interaction between cPOSS and the substrate accompanying modification of the PS-substrate interface.
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U2 - 10.1163/1568554041738157
DO - 10.1163/1568554041738157
M3 - Article
AN - SCOPUS:4744338217
VL - 11
SP - 297
EP - 306
JO - Composite Interfaces
JF - Composite Interfaces
SN - 0927-6440
IS - 4
ER -