Influence of Ti Doping Levels on the Photoelectrochemical Properties of Thin-Film Hematite (α-Fe₂O₃) Photoanodes

Engineering & Materials Science

• Hematite 100%
• Doping (additives) 77%
• Thin films 65%
• Positive ions 43%
• Transparent electrodes 19%
• Pulsed laser deposition 17%
• Photocurrents 16%
• Tin oxides 15%
• Charge transfer 14%
• Optical properties 14%
• Spectroscopy 12%
• Film thickness 12%
• Electrons 11%
• Glass 9%
• Substrates 8%
• Microstructure 7%

Chemical Compounds

• Hematite 75%
• Pulsed Laser Deposition 30%
• Tin Oxide 24%
• Charge Separation 22%
• Glass Substrate 22%
• Liquid Film 22%
• Photocurrent 21%
• Optical Property 16%
• Charge Transfer 16%
• Microstructure 15%
• Conductivity 15%
• Spectroscopy 14%
• Electron Particle 12%
• Behavior as Electrode 11%

Physics & Astronomy

• hematite 84%
• thin films 35%
• cations 29%
• polarization (charge separation) 13%
• tin oxides 11%
• pulsed laser deposition 10%
• photocurrents 10%
• performance 10%
• charge transfer 9%
• film thickness 9%
• conductivity 7%
• optical properties 7%
• electrodes 7%
• microstructure 6%
• glass 6%
• spectroscopy 6%