We demonstrate for the first time the crystallization of amorphous Si induced by Ni colloid printing using inkjet printing technology. An electrostatic inkjet nozzle having a needle inside a capillary was built in house, which was able to eject very fine droplets according to the applied electric voltage. Dots of Ni colloidal solution were formed in the prescribed position. Enhanced crystallization was observed at the Ni-colloid-printed sites. The probability of crystallization decreased with the Ni concentration in the solution. At and above 4 mass % Ni concentration, fully enhanced crystallization occurred. Furthermore, the orientation of crystallized Si grains was determined by electron-backscattering pattern (EBSP) analysis. The dependence of crystallization behavior on tne Ni concentration was also investigated.
|Number of pages||5|
|Journal||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|Issue number||3 B|
|Publication status||Published - Mar 16 2007|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)