Inkjet-printed metal-colloid-induced crystallization of amorphous silicon

Yuji Ishida, Gou Nakagawa, Tanemasa Asano

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

We demonstrate for the first time the crystallization of amorphous Si induced by Ni colloid printing using inkjet printing technology. An electrostatic inkjet nozzle having a needle inside a capillary was built in house, which was able to eject very fine droplets according to the applied electric voltage. Dots of Ni colloidal solution were formed in the prescribed position. Enhanced crystallization was observed at the Ni-colloid-printed sites. The probability of crystallization decreased with the Ni concentration in the solution. At and above 4 mass % Ni concentration, fully enhanced crystallization occurred. Furthermore, the orientation of crystallized Si grains was determined by electron-backscattering pattern (EBSP) analysis. The dependence of crystallization behavior on tne Ni concentration was also investigated.

Original languageEnglish
Pages (from-to)1263-1267
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number3 B
DOIs
Publication statusPublished - Mar 16 2007

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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