Abstract
We demonstrated for the first time single-crystal grain growth in the solid-phase crystallization of amorphous silicon (a-Si) film induced by inkjet-printed colloidal solution containing Ni nanosized particles. The electrostatic inkjet nozzle with a needle can print dots of Ni colloidal solution, whose size ranges from submicron order to a few ten micrometers, on the a-Si film surface by controlling the needle apex radius and the number of applied voltage pulses. The dependence of the crystallization behavior of a-Si on dot size is investigated by electron backscattering pattern (EBSP) analysis. Crystallization behavior is categorized into three modes: single-crystal growth, polycrystal growth, and lateral-crystal growth. Statistical analysis suggests that, when the dot size is 0.86 μm in diameter, a single-crystal grain is grown at the inkjet-printed sites with a probability of 0.62.
Original language | English |
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Pages (from-to) | 6437-6443 |
Number of pages | 7 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 46 |
Issue number | 9 B |
DOIs | |
Publication status | Published - Sept 20 2007 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)