Innovative in-flight glass-melting technology using thermal plasmas

Takayuki Watanabe, Kazuyuki Yatsuda, Yaochun Yao, Tetsuji Yano, Tsugio Matuura

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

A stable 12-phase AC arc was generated by transformers at a commercial electric power system, and the arc behavior was characterized by image analysis. For the unique advantages, the multiphase AC arc was developed to apply to in-flight glass melting for the purpose of energy-saving and emission reduction. The effects of electrode configuration and sheath gas flow rate on the arc and melting behavior of granulated glass raw material were investigated. Results show that the discharge behavior and the high-temperature region can be controlled by the electrode configuration. The luminance area of the high-temperature region and its fluctuation reflect the discharge behavior. The vitrification degree of glass raw material is mostly dependent on the center temperature of arc. As sheath gas flow rate increases, the ratio of luminance area decreases and the center temperature of arc increases.

Original languageEnglish
Pages (from-to)1337-1351
Number of pages15
JournalPure and Applied Chemistry
Volume82
Issue number6
DOIs
Publication statusPublished - Jun 14 2010
Externally publishedYes

Fingerprint

Plasma Gases
Melting
Plasmas
Glass
Flow of gases
Luminance
Raw materials
Flow rate
Vitrification
Temperature
Electrodes
Electric power systems
Image analysis
Energy conservation
Hot Temperature

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)

Cite this

Innovative in-flight glass-melting technology using thermal plasmas. / Watanabe, Takayuki; Yatsuda, Kazuyuki; Yao, Yaochun; Yano, Tetsuji; Matuura, Tsugio.

In: Pure and Applied Chemistry, Vol. 82, No. 6, 14.06.2010, p. 1337-1351.

Research output: Contribution to journalArticle

Watanabe, Takayuki ; Yatsuda, Kazuyuki ; Yao, Yaochun ; Yano, Tetsuji ; Matuura, Tsugio. / Innovative in-flight glass-melting technology using thermal plasmas. In: Pure and Applied Chemistry. 2010 ; Vol. 82, No. 6. pp. 1337-1351.
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