Instabilities associated with a negative rf resistance in current-carrying ion sheaths

N. Ohno, A. Komori, M. Tanaka, Y. Kawai

    Research output: Contribution to journalArticle

    22 Citations (Scopus)

    Abstract

    Coherent instabilities on the order of the ion plasma frequency are generated by applying a dc voltage between a meshed grid and a disk target in an unmagnetized plasma. The instability occurs in the ion-rich current-carrying sheath on the negatively charged grid when some ions are reflected from the grid to the sheath edge by the potential difference between two plasmas divided by the grid. The exciting mechanism of the instability has been identified as a negative rf resistance associated with the ion inertia in the ion-rich sheath, coupled to an ion resonance caused by a positive feedback due to the reflection of ions in the sheath region. The frequency of the instability, which is proportional to the plasma density, is basically determined by the ion transit time through the sheath, and thus, is proportional to the product of inverse sheath thickness and average ion velocity related to the applied voltage.

    Original languageEnglish
    Pages (from-to)228-235
    Number of pages8
    JournalPhysics of Fluids B
    Volume3
    Issue number1
    DOIs
    Publication statusPublished - 1991

    Fingerprint

    ion sheaths
    Plasma sheaths
    Negative resistance
    Ions
    sheaths
    grids
    ions
    Plasma stability
    Plasmas
    positive feedback
    electric potential
    transit time
    plasma frequencies
    inertia
    ion currents
    plasma density
    Plasma density
    Electric potential
    products
    Feedback

    All Science Journal Classification (ASJC) codes

    • Computational Mechanics
    • Condensed Matter Physics
    • Mechanics of Materials
    • Physics and Astronomy(all)
    • Fluid Flow and Transfer Processes

    Cite this

    Instabilities associated with a negative rf resistance in current-carrying ion sheaths. / Ohno, N.; Komori, A.; Tanaka, M.; Kawai, Y.

    In: Physics of Fluids B, Vol. 3, No. 1, 1991, p. 228-235.

    Research output: Contribution to journalArticle

    Ohno, N. ; Komori, A. ; Tanaka, M. ; Kawai, Y. / Instabilities associated with a negative rf resistance in current-carrying ion sheaths. In: Physics of Fluids B. 1991 ; Vol. 3, No. 1. pp. 228-235.
    @article{4a9dd496f2f8460fb109d98e0865dbec,
    title = "Instabilities associated with a negative rf resistance in current-carrying ion sheaths",
    abstract = "Coherent instabilities on the order of the ion plasma frequency are generated by applying a dc voltage between a meshed grid and a disk target in an unmagnetized plasma. The instability occurs in the ion-rich current-carrying sheath on the negatively charged grid when some ions are reflected from the grid to the sheath edge by the potential difference between two plasmas divided by the grid. The exciting mechanism of the instability has been identified as a negative rf resistance associated with the ion inertia in the ion-rich sheath, coupled to an ion resonance caused by a positive feedback due to the reflection of ions in the sheath region. The frequency of the instability, which is proportional to the plasma density, is basically determined by the ion transit time through the sheath, and thus, is proportional to the product of inverse sheath thickness and average ion velocity related to the applied voltage.",
    author = "N. Ohno and A. Komori and M. Tanaka and Y. Kawai",
    year = "1991",
    doi = "10.1063/1.859940",
    language = "English",
    volume = "3",
    pages = "228--235",
    journal = "Physics of Fluids B",
    issn = "0899-8221",
    publisher = "American Institute of Physics Publising LLC",
    number = "1",

    }

    TY - JOUR

    T1 - Instabilities associated with a negative rf resistance in current-carrying ion sheaths

    AU - Ohno, N.

    AU - Komori, A.

    AU - Tanaka, M.

    AU - Kawai, Y.

    PY - 1991

    Y1 - 1991

    N2 - Coherent instabilities on the order of the ion plasma frequency are generated by applying a dc voltage between a meshed grid and a disk target in an unmagnetized plasma. The instability occurs in the ion-rich current-carrying sheath on the negatively charged grid when some ions are reflected from the grid to the sheath edge by the potential difference between two plasmas divided by the grid. The exciting mechanism of the instability has been identified as a negative rf resistance associated with the ion inertia in the ion-rich sheath, coupled to an ion resonance caused by a positive feedback due to the reflection of ions in the sheath region. The frequency of the instability, which is proportional to the plasma density, is basically determined by the ion transit time through the sheath, and thus, is proportional to the product of inverse sheath thickness and average ion velocity related to the applied voltage.

    AB - Coherent instabilities on the order of the ion plasma frequency are generated by applying a dc voltage between a meshed grid and a disk target in an unmagnetized plasma. The instability occurs in the ion-rich current-carrying sheath on the negatively charged grid when some ions are reflected from the grid to the sheath edge by the potential difference between two plasmas divided by the grid. The exciting mechanism of the instability has been identified as a negative rf resistance associated with the ion inertia in the ion-rich sheath, coupled to an ion resonance caused by a positive feedback due to the reflection of ions in the sheath region. The frequency of the instability, which is proportional to the plasma density, is basically determined by the ion transit time through the sheath, and thus, is proportional to the product of inverse sheath thickness and average ion velocity related to the applied voltage.

    UR - http://www.scopus.com/inward/record.url?scp=0000702705&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0000702705&partnerID=8YFLogxK

    U2 - 10.1063/1.859940

    DO - 10.1063/1.859940

    M3 - Article

    AN - SCOPUS:0000702705

    VL - 3

    SP - 228

    EP - 235

    JO - Physics of Fluids B

    JF - Physics of Fluids B

    SN - 0899-8221

    IS - 1

    ER -