Integration of High-k Oxide on MoS2 by Using Ozone Pretreatment for High-Performance MoS2 Top-Gated Transistor with Thickness-Dependent Carrier Scattering Investigation

Jingli Wang, Songlin Li, Xuming Zou, Johnny Ho, Lei Liao, Xiangheng Xiao, Changzhong Jiang, Weida Hu, Jianlu Wang, Jinchai Li

Research output: Contribution to journal › Article › peer-review

51 Citations (Scopus)

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