TY - GEN
T1 - Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas
AU - Soejima, Masahiro
AU - Koga, Kazunori
AU - Shiratani, Masaharu
PY - 2016/11/21
Y1 - 2016/11/21
N2 - We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.
AB - We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.
UR - http://www.scopus.com/inward/record.url?scp=85006852817&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85006852817&partnerID=8YFLogxK
U2 - 10.1109/NANO.2016.7751376
DO - 10.1109/NANO.2016.7751376
M3 - Conference contribution
AN - SCOPUS:85006852817
T3 - 16th International Conference on Nanotechnology - IEEE NANO 2016
SP - 671
EP - 673
BT - 16th International Conference on Nanotechnology - IEEE NANO 2016
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016
Y2 - 22 August 2016 through 25 August 2016
ER -