Abstract
We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.
| Original language | English |
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| Title of host publication | 16th International Conference on Nanotechnology - IEEE NANO 2016 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 671-673 |
| Number of pages | 3 |
| ISBN (Electronic) | 9781509039142 |
| DOIs | |
| Publication status | Published - Nov 21 2016 |
| Event | 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 - Sendai, Japan Duration: Aug 22 2016 → Aug 25 2016 |
Publication series
| Name | 16th International Conference on Nanotechnology - IEEE NANO 2016 |
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Other
| Other | 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 |
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| Country | Japan |
| City | Sendai |
| Period | 8/22/16 → 8/25/16 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
Cite this
Soejima, M., Koga, K., & Shiratani, M. (2016). Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. In 16th International Conference on Nanotechnology - IEEE NANO 2016 (pp. 671-673). [7751376] (16th International Conference on Nanotechnology - IEEE NANO 2016). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/NANO.2016.7751376