Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.

Original languageEnglish
Title of host publication16th International Conference on Nanotechnology - IEEE NANO 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages671-673
Number of pages3
ISBN (Electronic)9781509039142
DOIs
Publication statusPublished - Nov 21 2016
Event16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 - Sendai, Japan
Duration: Aug 22 2016Aug 25 2016

Publication series

Name16th International Conference on Nanotechnology - IEEE NANO 2016

Other

Other16th IEEE International Conference on Nanotechnology - IEEE NANO 2016
CountryJapan
CitySendai
Period8/22/168/25/16

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this

Soejima, M., Koga, K., & Shiratani, M. (2016). Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. In 16th International Conference on Nanotechnology - IEEE NANO 2016 (pp. 671-673). [7751376] (16th International Conference on Nanotechnology - IEEE NANO 2016). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/NANO.2016.7751376