Abstract
By utilizing pulsed laser deposition (PLD), heterojunctions comprised of n-type nanocrystalline (NC) FeSi2/ thin films and p-type Si substrates were fabricated at room temperature in this study. Both dark and illuminated current density-voltage (J-V ) curves for the heterojunctions were measured and analyzed at room temperature. The heterojunctions demonstrated a large reverse leakage current as well as a weak near-infrared light response. Based on the analysis of the dark forward J-V curves, at the V value ≤ 0.2 V, we show that a carrier recombination process was governed at the heterojunction interface. When the V value was > 0.2 V, the probable mechanism of carrier transportation was a space-charge limitedcurrent process. Both the measurement and analysis for capacitance-voltage-frequency (C-V-f ) and conductance-voltage-frequency (G-V-f ) curves were performed in the applied frequency ( f ) range of 50 kHz-2 MHz at room temperature. From the C-V-f and G-V-f curves, the density of interface states (Nss) for the heterojunctions was computed by using the Hill-Coleman method. The Nss values were 9.19 × 1012 eV-1 cm-2 at 2 MHz and 3.15 × 1014 eV-1 cm-2 at 50 kHz, which proved the existence of interface states at the heterojunction interface. These interface states are the probable cause of the degraded electrical performance in the heterojunctions.
| Original language | English |
|---|---|
| Article number | 035016 |
| Journal | Advances in Natural Sciences: Nanoscience and Nanotechnology |
| Volume | 8 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - Sep 2017 |
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All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering
Cite this
Interface-state density estimation of n-type nanocrystalline FeSi2/p-type Si heterojunctions fabricated by pulsed laser deposition. / Nopparuchikun, Adison; Promros, Nathaporn; Sittimart, Phongsaphak; Onsee, Peeradon; Duangrawa, Asanlaya; Teakchaicum, Sakmongkon; Nogami, Tomohiro; Yoshitake, Tsuyoshi.
In: Advances in Natural Sciences: Nanoscience and Nanotechnology, Vol. 8, No. 3, 035016, 09.2017.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Interface-state density estimation of n-type nanocrystalline FeSi2/p-type Si heterojunctions fabricated by pulsed laser deposition
AU - Nopparuchikun, Adison
AU - Promros, Nathaporn
AU - Sittimart, Phongsaphak
AU - Onsee, Peeradon
AU - Duangrawa, Asanlaya
AU - Teakchaicum, Sakmongkon
AU - Nogami, Tomohiro
AU - Yoshitake, Tsuyoshi
PY - 2017/9
Y1 - 2017/9
N2 - By utilizing pulsed laser deposition (PLD), heterojunctions comprised of n-type nanocrystalline (NC) FeSi2/ thin films and p-type Si substrates were fabricated at room temperature in this study. Both dark and illuminated current density-voltage (J-V ) curves for the heterojunctions were measured and analyzed at room temperature. The heterojunctions demonstrated a large reverse leakage current as well as a weak near-infrared light response. Based on the analysis of the dark forward J-V curves, at the V value ≤ 0.2 V, we show that a carrier recombination process was governed at the heterojunction interface. When the V value was > 0.2 V, the probable mechanism of carrier transportation was a space-charge limitedcurrent process. Both the measurement and analysis for capacitance-voltage-frequency (C-V-f ) and conductance-voltage-frequency (G-V-f ) curves were performed in the applied frequency ( f ) range of 50 kHz-2 MHz at room temperature. From the C-V-f and G-V-f curves, the density of interface states (Nss) for the heterojunctions was computed by using the Hill-Coleman method. The Nss values were 9.19 × 1012 eV-1 cm-2 at 2 MHz and 3.15 × 1014 eV-1 cm-2 at 50 kHz, which proved the existence of interface states at the heterojunction interface. These interface states are the probable cause of the degraded electrical performance in the heterojunctions.
AB - By utilizing pulsed laser deposition (PLD), heterojunctions comprised of n-type nanocrystalline (NC) FeSi2/ thin films and p-type Si substrates were fabricated at room temperature in this study. Both dark and illuminated current density-voltage (J-V ) curves for the heterojunctions were measured and analyzed at room temperature. The heterojunctions demonstrated a large reverse leakage current as well as a weak near-infrared light response. Based on the analysis of the dark forward J-V curves, at the V value ≤ 0.2 V, we show that a carrier recombination process was governed at the heterojunction interface. When the V value was > 0.2 V, the probable mechanism of carrier transportation was a space-charge limitedcurrent process. Both the measurement and analysis for capacitance-voltage-frequency (C-V-f ) and conductance-voltage-frequency (G-V-f ) curves were performed in the applied frequency ( f ) range of 50 kHz-2 MHz at room temperature. From the C-V-f and G-V-f curves, the density of interface states (Nss) for the heterojunctions was computed by using the Hill-Coleman method. The Nss values were 9.19 × 1012 eV-1 cm-2 at 2 MHz and 3.15 × 1014 eV-1 cm-2 at 50 kHz, which proved the existence of interface states at the heterojunction interface. These interface states are the probable cause of the degraded electrical performance in the heterojunctions.
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U2 - 10.1088/2043-6254/aa7241
DO - 10.1088/2043-6254/aa7241
M3 - Article
AN - SCOPUS:85028004911
VL - 8
JO - Advances in Natural Sciences: Nanoscience and Nanotechnology
JF - Advances in Natural Sciences: Nanoscience and Nanotechnology
SN - 2043-6262
IS - 3
M1 - 035016
ER -