Interfacial observations of Ni/Ni3Si and Ni/Ni3Ga diffusion couples

Z. Horita, K. Fujiwara, Y. Ootoshi, N. Komai, M. Watanabe, M. Nemoto

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Abstract

Microstructural observations and selected-area electron diffraction analyses are conducted around the diffusion-couple interfaces of Ni/Ni3Si and Ni/Ni3Ga. The Ni-rich solid solution phase (γ phase) grows towards the Ni3Si- or Ni3Ga-based intermetallic phase (γ′ phase) during diffusion annealing and there exists the same crystallographic orientation relationship between the γ and γ′ phases. It is demonstrated that this growth process and structural faeatures are characteristic of the diffusion couples between pure Ni and Ni-based intermetallics with the Ll2-type crystal structure. It is shown that the focused-ion-beam cutting technique is a useful tool for preparing thin specimens for transmission electron microscopy.

Original languageEnglish
Pages (from-to)149-153
Number of pages5
JournalPhilosophical Magazine Letters
Volume75
Issue number3
DOIs
Publication statusPublished - Mar 1997

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

Cite this

Horita, Z., Fujiwara, K., Ootoshi, Y., Komai, N., Watanabe, M., & Nemoto, M. (1997). Interfacial observations of Ni/Ni3Si and Ni/Ni3Ga diffusion couples. Philosophical Magazine Letters, 75(3), 149-153. https://doi.org/10.1080/095008397179705